Abstract: A cleaning method for cleaning a surface of a medical device, the method including a contaminant removal phase including: (a) injecting a continuous flow of gas in an atomization chamber, through a first input of the atomization chamber; and (b) introducing a plurality of successive discharges of liquid in the atomization chamber through a second input of the atomization chamber, each discharge including a respective amount of liquid, a duration between two successive discharges being strictly greater than zero, thereby generating, at an output of the atomization chamber, a cleaning flow including, successively over time, liquid droplets suspended in gas, the cleaning flow being oriented towards the surface of the medical device.

Abstract: A cleaning method for cleaning a surface of a medical device, the method including a contaminant removal phase including: (a) injecting a continuous flow of gas in an atomization chamber, through a first input of the atomization chamber; and (b) introducing a plurality of successive discharges of liquid in the atomization chamber through a second input of the atomization chamber, each discharge including a respective amount of liquid, a duration between two successive discharges being strictly greater than zero, thereby generating, at an output of the atomization chamber, a cleaning flow including, successively over time, liquid droplets suspended in gas, the cleaning flow being oriented towards the surface of the medical device.

Abstract: Disclosed is a method for drying endoscope channels, including the following steps: a) connecting the endoscope, particularly via a specific connection, to a plasma drying unit; b) injecting a neutral gas into the endoscope channels for a duration of 10 to 60 seconds, the flow rate of the gas being low, the gas being injected at a temperature of 10° C. to 30° C. such as to eliminate residual water; then c) drying the endoscope channels, for a duration of 30 to 150 seconds, by injecting a gas at a high flow rate, the gas being injected at a temperature of 30° C. to 60° C.

Abstract: The present invention relates to a method for drying endoscope channels, including the following steps: a) connecting the endoscope, particularly via a specific connection, to a plasma drying unit; b) injecting a neutral gas into the endoscope channels for a duration of 10 to 60 seconds, the flow rate of the gas being low, the gas being injected at a temperature of 10° C. to 30° C. such as to eliminate residual water; then c) drying the endoscope channels, for a duration of 30 to 150 seconds, by injecting a gas at a high flow rate, the gas being injected at a temperature of 30° C. to 60° C.