Abstract: Methods of lithographic patterning and structures formed by lithographic patterning. A hardmask layer is formed on a dielectric layer, a feature is formed on the hardmask layer, and a mandrel is formed that extends in a first direction across the first feature. The mandrel and the hardmask layer beneath the mandrel are removed to pattern the hardmask layer with the feature masking a section of the hardmask layer. After the hardmask layer is patterned, the dielectric layer is etched to form a first trench and a second trench that are separated by a section of the dielectric layer masked by the section of the hardmask layer. The first trench and the second trench are filled with a conductor layer to respectively form a first wire and a second wire that is separated from the first wire by the section of the dielectric layer.

Abstract: A new and useful therapeutic device and method designed to receive the occipital condyle of a human skull and to engage the suboccipital area of a human skull in a manner that promotes one or more therapeutic modalities (e.g. muscle inhibition, occipital decompression, cranio-sacral release), while also accounting for different anatomies of the persons who use it is provided. The therapeutic device includes a base and a cushion that are configured such that the cushion can be selectively supported on the base in either of two configurations; a relatively high configuration and a relatively low configuration. The base and cushion are also configured such that in either the relatively high or low configurations, the base and cushion define a support for the occipital condyle of a human skull and engages the suboccipital area of a human skull in a manner that promotes one or more therapeutic modalities (e.g. muscle inhibition, occipital decompression, cranio-sacral release).