Patents by Inventor Daniel Wack

Daniel Wack has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10438825
    Abstract: Methods and systems for performing in-situ, selective spectral reflectometry (SSR) measurements of semiconductor structures disposed on a wafer are presented herein. Illumination light reflected from a wafer surface is spatially imaged. Signals from selected regions of the image are collected and spectrally analyzed, while other portions of the image are discarded. In some embodiments, a SSR includes a dynamic mirror array (DMA) disposed in the optical path at or near a field plane conjugate to the surface of the semiconductor wafer under measurement. The DMA selectively blocks the undesired portion of wafer image. In other embodiments, a SSR includes a hyperspectral imaging system including a plurality of spectrometers each configured to collect light from a spatially distinct area of a field image conjugate to the wafer surface. Selected spectral signals associated with desired regions of the wafer image are selected for analysis.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: October 8, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Prateek Jain, Daniel Wack, Kevin A. Peterlinz, Andrei V. Shchegrov, Shankar Krishnan
  • Publication number: 20190219111
    Abstract: A method for the transmission and damping of a mean torque with a superposed alternating torque in an arrangement having an input and an output. The mean torque and superposed alternating torque are transmitted along a path from the input to the output. A slip arrangement is provided in the torque path between the input and the output for transmitting mean torque and superposed alternating torque and for generating a speed slip between an input speed and an output speed in the path. The slip arrangement provides a maximum of an external activation of the speed slip in the area of the maxima of at least one periodic oscillation component of the alternating component and provides a minimum of an external activation of the speed slip in the area of the minima of at least one periodic oscillation component of the alternating component.
    Type: Application
    Filed: May 29, 2017
    Publication date: July 18, 2019
    Inventors: Tobias HÖCHE, Tobias DIECKHOFF, Daniel LORENZ, Andreas ORLAMÜNDER, Ingrid HOFFELNER, Wolfgang GROSSPIETSCH, Steffen MATSCHAS, Johannes FRIESS, Christofer EBERT, Matthias KRAM, Dennis EGLER, Axel ROHM, Erwin WACK, Bernd UNSELD, Thomas Dögel, Matthias REISCH, Christoph SASSE, Mathais KOPP
  • Publication number: 20190195298
    Abstract: A method for transmission of and damping of a mean torque with a superposed alternating torque in a torque transmission arrangement for a powertrain of a motor vehicle having an input and an output. The mean torque with the superposed alternating torque is transmitted along a torque path from the input the output. The input rotates at an input speed and the output rotates at an output speed. A slip arrangement is provided in the torque path between the input and the output for generating a speed slip. The slip arrangement provides a maximum of an external activation of the speed slip in the area of a maxima of at least one periodic oscillation component of an alternating component and provides a minimum of an external activation of the speed slip in the area of a minima of at least one periodic oscillation component of the alternating component (new).
    Type: Application
    Filed: May 29, 2017
    Publication date: June 27, 2019
    Applicant: ZF FRIEDRICHSHAFEN AG
    Inventors: Tobias HÖCHE, Tobias DIECKHOFF, Daniel LORENZ, Andreas ORLAMÜNDER, Ingrid HOFFELNER, Wolfgang GROSSPIETSCH, Steffen MATSCHAS, Johannes FRIESS, Christofer EBERT, Matthias KRAM, Dennis EGLER, Axel ROHM, Erwin WACK, Bernd UNSELD, Thomas DÖGEL, Matthias REISCH, Lukas SPATH, Angelika EBERT
  • Publication number: 20190162255
    Abstract: A method for the transmission and damping of a mean torque with a superposed alternating torque having an input and an output. The mean and superposed alternating torque is transmitted along a torque path from the input to the output area. An input speed is a mean speed and a superposed alternating component. A slip arrangement is provided in the torque path between the input and the output for transmitting the mean and superposed alternating torque and generating a speed slip between an input speed and an output speed. The slip arrangement provides a maximum of an external activation of the speed slip in a area of the maxima of at least one periodic oscillation component of the alternating component and provides a minimum of an external activation of the speed slip in an area of the minima of at least one periodic oscillation component of the alternating component.
    Type: Application
    Filed: May 29, 2017
    Publication date: May 30, 2019
    Applicant: ZF FRIEDRICHSHAFEN AG
    Inventors: Tobias HÖCHE, Tobias DIECKHOFF, Daniel LORENZ, Andreas ORLAMÜNDER, Ingrid HOFFELNER, Wolfgang GROSSPIETSCH, Steffen MATSCHAS, Johannes FRIESS, Christofer EBERT, Matthias KRAM, Dennis EGLER, Axel ROHM, Erwin WACK, Bernd UNSELD, Thomas DÖGEL, Matthias REISCH, Lukas SPATH, Angelika EBERT
  • Publication number: 20190017946
    Abstract: Methods and systems for performing measurements of semiconductor structures based on high-brightness, polychromatic, reflective small angle x-ray scatterometry (RSAXS) metrology are presented herein. RSAXS measurements are performed over a range of wavelengths, angles of incidence, and azimuth angles with small illumination beam spot size, simultaneously or sequentially. In some embodiments, RSAXS measurements are performed with x-ray radiation in the soft x-ray (SXR) region at grazing angles of incidence in the range of 5-20 degrees. In some embodiments, the x-ray illumination source size is 10 micrometers or less, and focusing optics project the source area onto a wafer with a demagnification factor of 0.2 or less, enabling an incident x-ray illumination spot size of less than two micrometers.
    Type: Application
    Filed: July 9, 2018
    Publication date: January 17, 2019
    Inventors: Daniel Wack, Oleg Khodykin, Andrei V. Shchegrov, Alexander Kuznetsov, Nikolay Artemiev, Michael Friedmann
  • Publication number: 20180061691
    Abstract: Methods and systems for performing in-situ, selective spectral reflectometry (SSR) measurements of semiconductor structures disposed on a wafer are presented herein. Illumination light reflected from a wafer surface is spatially imaged. Signals from selected regions of the image are collected and spectrally analyzed, while other portions of the image are discarded. In some embodiments, a SSR includes a dynamic mirror array (DMA) disposed in the optical path at or near a field plane conjugate to the surface of the semiconductor wafer under measurement. The DMA selectively blocks the undesired portion of wafer image. In other embodiments, a SSR includes a hyperspectral imaging system including a plurality of spectrometers each configured to collect light from a spatially distinct area of a field image conjugate to the wafer surface. Selected spectral signals associated with desired regions of the wafer image are selected for analysis.
    Type: Application
    Filed: August 28, 2017
    Publication date: March 1, 2018
    Inventors: Prateek Jain, Daniel Wack, Kevin A. Peterlinz, Andrei V. Shchegrov, Shankar Krishnan
  • Patent number: 9759912
    Abstract: An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.
    Type: Grant
    Filed: September 23, 2013
    Date of Patent: September 12, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Frank Chilese, Gildardo R. Delgado, Daniel Wack, John R. Torczynski, Leonard E. Klebanoff
  • Patent number: 9625810
    Abstract: Methods and systems for source multiplexing illumination for mask inspection are disclosed. Such illumination systems enable EUV sources of small brightness to be used for EUV mask defect inspection at nodes below the 22 nm. Utilizing the multiple plane or conic mirrors that are either attached to a continuously rotating base with different angles or individually rotating to position for each pulse, the reflected beams may be directed through a common optical path. The light may then be focused by a condenser to an EUV mask. The reflected and scattered light from the mask may then be imaged by some imaging optics onto some sensors. The mask image may be subsequently processed for defect information.
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: April 18, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Daimian Wang, Daniel Wack, Damon F. Kvamme, Tao-Yi Fu
  • Patent number: 9335637
    Abstract: A method and apparatus for generating extreme ultraviolet (EUV) light is disclosed. The method may comprise non-thermally ablating a target material utilizing a first laser beam. The first laser beam may be configured for ejecting a portion of the target material in a non-thermal manner to create a plume. The method may further comprise irradiating the plume utilizing a second laser beam to produce a high-temperature plasma for EUV radiation.
    Type: Grant
    Filed: September 8, 2011
    Date of Patent: May 10, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Gildardo Delgado, Daniel Wack
  • Patent number: 9164388
    Abstract: An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to pass through disposed between the optics assembly and the reticle or sensor. The plate is cooled to a temperature less than that of the reticle or sensor. The plate is engineered to balance out heat absorbed from the reticle or sensor with heat absorbed by the plate. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: October 20, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Frank Chilese, Daniel Wack, Douglas Fowler
  • Patent number: 9151881
    Abstract: Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: October 6, 2015
    Assignee: KLA-Tencor Corporation
    Inventors: Daimian Wang, Oleg Khodykin, Daniel Wack, Li Wang, Yanwei Liu
  • Patent number: 8917432
    Abstract: The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: December 23, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Daniel Wack, Daimian Wang, Karl R. Umstadter, Ed Ma, Frank Chilese
  • Patent number: 8798966
    Abstract: One embodiment relates to a method of model-based optical metrology. An area of a geometrical structure of dispersive materials on a substrate is illuminated with polarized incident electromagnetic radiation using an illuminator of a scatterometer apparatus. Spectral components of the incident electromagnetic radiation reflected from the area are measured using a detector of the scatterometer apparatus. Using a computer for the scatterometer apparatus, parameter values are determined that minimize an objective function which represents a difference between the measured spectral components and computed spectral components based on a parameterized model of the geometrical structure. Steps for determining the parameter values that minimize the objective function include: computing a solution to state equations driven by a function representing the incident electromagnetic radiation, and computing a solution to an adjoint to the state equations. Other embodiments and features are also disclosed.
    Type: Grant
    Filed: January 3, 2007
    Date of Patent: August 5, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: John Hench, Daniel Wack, Edward Ratner, Yaoming Shi, Andrei Veldman
  • Patent number: 8772731
    Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: July 8, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Pradeep Subrahmanyan, Daniel Wack, Michael Wright, David Alles
  • Publication number: 20140131586
    Abstract: Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection.
    Type: Application
    Filed: March 5, 2013
    Publication date: May 15, 2014
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Daimian Wang, Oleg Khodykin, Daniel Wack, Li Wang, Yanwei Liu
  • Publication number: 20140085724
    Abstract: An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.
    Type: Application
    Filed: September 23, 2013
    Publication date: March 27, 2014
    Inventors: Frank Chilese, Gildardo R. Delgado, Daniel Wack, John R. Torczynski, Leonard E. Klebanoff
  • Publication number: 20140036333
    Abstract: The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 6, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: Daniel Wack, Daimian Wang, Karl R. Umstadter, Ed Ma, Frank Chilese
  • Publication number: 20130270444
    Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.
    Type: Application
    Filed: April 12, 2013
    Publication date: October 17, 2013
    Applicant: KLA-Tencor Corporation
    Inventors: Pradeep Subrahmanyan, Daniel Wack, Michael Wright, David Alles
  • Publication number: 20130265557
    Abstract: An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to pass through disposed between the optics assembly and the reticle or sensor. The plate is cooled to a temperature less than that of the reticle or sensor. The plate is engineered to balance out heat absorbed from the reticle or sensor with heat absorbed by the plate. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Application
    Filed: April 5, 2013
    Publication date: October 10, 2013
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Frank Chilese, Daniel Wack, Douglas Fowler
  • Publication number: 20130063803
    Abstract: A method and apparatus for generating extreme ultraviolet (EUV) light is disclosed. The method may comprise non-thermally ablating a target material utilizing a first laser beam. The first laser beam may be configured for ejecting a portion of the target material in a non-thermal manner to create a plume. The method may further comprise irradiating the plume utilizing a second laser beam to produce a high-temperature plasma for EUV radiation.
    Type: Application
    Filed: September 8, 2011
    Publication date: March 14, 2013
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Gildardo Delgado, Daniel Wack