Abstract: A method for determining an imaging quality of an optical system to be tested is presented. The method comprises a step of capturing an optical wavefront profile in a measurement plane behind an exit pupil of the optical system, a step of ascertaining a partial optical wavefront profile for each subaperture of a plurality of subapertures of the measurement plane using the wavefront profile, and a step of determining a partial optical imaging quality for each of the subapertures using the ascertained partial optical wavefront profiles.

Abstract: An apparatus for measuring a wavelength-dependent optical characteristic of an optical system has a light-pattern generation device which generates a pattern of polychromatic light in an object plane. Together with the optical system, a measuring optical unit images the object plane on a spatially resolving light sensor. A dispersive optical element is arranged in a light path between the optical system and the light sensor in such a way that a plurality of images of the pattern with different wavelengths are generated simultaneously on the light sensor. The evaluation device determines the wavelength-dependent characteristic of the optical system from the plurality of images on the light sensor.

Abstract: An apparatus for measuring a wavelength-dependent optical characteristic of an optical system has a light-pattern generation device which generates a pattern of polychromatic light in an object plane. Together with the optical system, a measuring optical unit images the object plane on a spatially resolving light sensor. A dispersive optical element is arranged in a light path between the optical system and the light sensor in such a way that a plurality of images of the pattern with different wavelengths are generated simultaneously on the light sensor. The evaluation device determines the wavelength-dependent characteristic of the optical system from the plurality of images on the light sensor.