Patents by Inventor Daniel Woodland

Daniel Woodland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEMS AND METHODS FOR ROUTE SYNCHRONIZATION FOR ROBOTIC DEVICES
    Publication number: 20230004166
    Abstract: Systems and methods for route synchronization between two or more robots to allow for a single training run of a route to effectively train multiple robots to follow the route.
    Type: Application
    Filed: September 12, 2022
    Publication date: January 5, 2023
    Inventors: Dan Sackinger, Jarad Cannon, Josh Klein, Daniel Woodlands
  • Compositions and methods for CMP of low-k-dielectric materials
    Patent number: 7456107
    Abstract: The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing low-k dielectric materials. The composition comprises a particulate abrasive material, at least one silicone-free nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, at least one silicone-containing nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, and an aqueous carrier therefor. A CMP method for polishing a low-k dielectric surface utilizing the composition is also disclosed.
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: November 25, 2008
    Assignee: Cabot Microelectronics Corporation
    Inventors: Jason Keleher, Daniel Woodland, Francesco De Rege Thesauro, Robert Medsker, Jason Aggio
  • Compositions and methods for CMP of low-k-dielectric materials
    Publication number: 20080111101
    Abstract: The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing low-k dielectric materials. The composition comprises a particulate abrasive material, at least one silicone-free nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, at least one silicone-containing nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, and an aqueous carrier therefor. A CMP method for polishing a low-k dielectric surface utilizing the composition is also disclosed.
    Type: Application
    Filed: November 9, 2006
    Publication date: May 15, 2008
    Inventors: Jason Keleher, Daniel Woodland, Francesco De Rege Thesauro, Robert Medsker, Jason Aggio
  • Method of making an easily cleanable polymer laminate
    Publication number: 20050048213
    Abstract: A method for preparing a substrate having an adherent, durable, flexible, and stain resistant layer. The layer is formed by applying a composition that includes (i) the reaction product of a polyester and a polyoxetane having at least one carboxylic acid end group and at least one pendant —CH2—O—(CH2)n-Rf group and (ii) an amino resin curative. The substrate may be printed or embossed or both. The coated substrate has both stain resistant properties and dry erase properties.
    Type: Application
    Filed: October 15, 2004
    Publication date: March 3, 2005
    Inventors: Marten Callicott, David Hyde, Charles Kausch, Anthony Verrocchi, Joe Wright, Raymond Weinert, Robert Medsker, Daniel Woodland, Daniel Gottschalk, Edward Kresge