Patents by Inventor Daniel Woodrow Phifer, Jr.

Daniel Woodrow Phifer, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9070533
    Abstract: A gas injection system provides a local region at the sample surface that has sufficient gas concentration to be ionized by secondary electrons to neutralize charged on the sample surface. In some embodiments, a gas concentration structure concentrates the gas near the surface. An optional hole in the gas concentration structure allows the charged particle beam to impact the interior of a shrouded region. In some embodiments, an anode near the surface increases the number of ions that return to the work piece surface for charge neutralization, the anode in some embodiments being a part of the gas injection system and in some embodiments being a separate structure.
    Type: Grant
    Filed: July 30, 2013
    Date of Patent: June 30, 2015
    Assignee: FEI COMPANY
    Inventors: Marc Castagna, Clive D. Chandler, Wayne Kurowski, Daniel Woodrow Phifer, Jr.
  • Patent number: 8698078
    Abstract: This invention relates to a method of examining a sample using a charged-particle microscope. This invention solves the problem of occlusion effects, whereby a given line-of-sight behind a particular region on a sample and a given detector is blocked by a topographical feature on the sample, thus hampering detection of the emitted radiation emanating from the occluded region. This problem is solved by using at least a first and second detector configuration to detect each portion of the emitted radiation and to produce at least a first and second corresponding image based thereupon; and using computer processing apparatus to automatically compare different members of the set of corresponding images and mathematically identify on the sample at least one occlusion region with an occluded line-of-sight relative to at least one of the detector configurations.
    Type: Grant
    Filed: May 15, 2012
    Date of Patent: April 15, 2014
    Assignee: FEI Company
    Inventors: Daniel Woodrow Phifer, Jr., Faysal Boughorbel
  • Publication number: 20140034830
    Abstract: A gas injection system provides a local region at the sample surface that has sufficient gas concentration to be ionized by secondary electrons to neutralize charged on the sample surface. In some embodiments, a gas concentration structure concentrates the gas near the surface. An optional hole in the gas concentration structure allows the charged particle beam to impact the interior of a shrouded region. In some embodiments, an anode near the surface increases the number of ions that return to the work piece surface for charge neutralization, the anode in some embodiments being a part of the gas injection system and in some embodiments being a separate structure.
    Type: Application
    Filed: July 30, 2013
    Publication date: February 6, 2014
    Applicant: FEI Company
    Inventors: Marc Castagna, Clive D. Chandler, Wayne Kurowski, Daniel Woodrow Phifer, JR.
  • Patent number: 8389936
    Abstract: The invention describes a method for inspecting samples in an electron microscope. A sample carrier 500 shows electrodes 504, 507 connecting pads 505, 508 with areas A on which the sample is to be placed. After placing the sample on the sample carrier, a conductive pattern is deposited on the sample, so that voltages and currents can be applied to localized parts of the sample. Applying the pattern on the sample may be done with, for example, Beam Induced Deposition or ink-jet printing. The invention also teaches building electronic components, such as resistors, capacitors, inductors and active elements such as FET's in the sample.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: March 5, 2013
    Assignee: FEI Company
    Inventors: Bert Henning Freitag, Georg Alexander Rosenthal, Daniel Woodrow Phifer, Jr.
  • Publication number: 20120292503
    Abstract: This invention relates to a method of examining a sample using a charged-particle microscope. This invention solves the problem of occlusion effects, whereby a given line-of-sight behind a particular region on a sample and a given detector is blocked by a topographical feature on the sample, thus hampering detection of the emitted radiation emanating from the occluded region. This problem is solved by using at least a first and second detector configuration to detect each portion of the emitted radiation and to produce at least a first and second corresponding image based thereupon; and using computer processing apparatus to automatically compare different members of the set of corresponding images and mathematically identify on the sample at least one occlusion region with an occluded line-of-sight relative to at least one of the detector configurations.
    Type: Application
    Filed: May 15, 2012
    Publication date: November 22, 2012
    Applicant: FEI COMPANY
    Inventors: Daniel Woodrow Phifer, JR., Faysal Boughorbel
  • Publication number: 20110006208
    Abstract: The invention describes a method for inspecting samples in an electron microscope. A sample carrier 500 shows electrodes 504, 507 connecting pads 505, 508 with areas A on which the sample is to be placed. After placing the sample on the sample carrier, a conductive pattern is deposited on the sample, so that voltages and currents can be applied to localized parts of the sample. Applying the pattern on the sample may be done with, for example, Beam Induced Deposition or ink-jet printing. The invention also teaches building electronic components, such as resistors, capacitors, inductors and active elements such as FET's in the sample.
    Type: Application
    Filed: July 9, 2010
    Publication date: January 13, 2011
    Applicant: FEI COMPANY
    Inventors: Bert Henning Freitag, Georg Alexander Rosenthal, Daniel Woodrow Phifer, JR.