Abstract: Various embodiments are generally directed to an apparatus and method for determining when an eye is focused on a display scene and determining movement of the eye based on image information when the eye is focused on the display scene. Various embodiments may also include detecting motion of an apparatus based on motion information and adjusting at least one of a position and a size of a frame in the display scene based on at least one of the movement of the eye and the motion of the apparatus.

Abstract: Described are platforms, systems, media, and methods for providing a biologic information visual synthesis application, the biologic information including one or more of: genome data, microbiome data, and metabolome data.

Abstract: A method for determining the location of a touch input in an application window on an interactive surface of a display device is described. The application window comprises a canvas configured to display at least a portion of a user interface. The method comprises the following steps. A first location of the touch input associated with a first coordinate space is determined. The first coordinate space is associated with the interactive surface. The touch input is used to emulate a mouse event. A second location of the touch input associated with a second coordinate space is determined in response to the emulated mouse event. The second coordinate space is associated with the user interface. At least one offset parameter is calculated, correlating the first coordinate space with the second coordinate space.

Abstract: Various embodiments are generally directed to an apparatus and method for determining when an eye is focused on a display scene and determining movement of the eye based on image information when the eye is focused on the display scene. Various embodiments may also include detecting motion of an apparatus based on motion information and adjusting at least one of a position and a size of a frame in the display scene based on at least one of the movement of the eye and the motion of the apparatus.

Abstract: A method for determining the location of a touch input in an application window on an interactive surface of a display device is described. The application window comprises a canvas configured to display at least a portion of a user interface. The method comprises the following steps. A first location of the touch input associated with a first coordinate space is determined. The first coordinate space is associated with the interactive surface. The touch input is used to emulate a mouse event. A second location of the touch input associated with a second coordinate space is determined in response to the emulated mouse event. The second coordinate space is associated with the user interface. At least one offset parameter is calculated, correlating the first coordinate space with the second coordinate space.

Abstract: One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

Abstract: One embodiment of the present invention provides a system that automatically processes manufacturing hotspot information. During operation, the system receives a pattern clip associated with a manufacturing hotspot in a layout, wherein the pattern clip comprises a set of polygons in proximity to the manufacturing hotspot's location. Next, the system determines if the pattern clip matches a known manufacturing hotspot configuration. If the pattern clip does not match a known manufacturing hotspot configuration, the system then performs a perturbation process on the pattern clip to determine a set of correction recommendations to eliminate the manufacturing hotspot. By performing the perturbation process, the system additionally determines ranges of perturbation to the set of polygons wherein the perturbed pattern clip does not eliminate the manufacturing hotspot. Subsequently, the system stores the set of correction recommendations and the ranges of perturbation into a manufacturing hotspot database.

Abstract: One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database.

Abstract: One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database.

Abstract: One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

Abstract: One embodiment of the present invention provides a system that automatically processes manufacturing hotspot information. During operation, the system receives a pattern clip associated with a manufacturing hotspot in a layout, wherein the pattern clip comprises a set of polygons in proximity to the manufacturing hotspot's location. Next, the system determines if the pattern clip matches a known manufacturing hotspot configuration. If the pattern clip does not match a known manufacturing hotspot configuration, the system then performs a perturbation process on the pattern clip to determine a set of correction recommendations to eliminate the manufacturing hotspot. By performing the perturbation process, the system additionally determines ranges of perturbation to the set of polygons wherein the perturbed pattern clip does not eliminate the manufacturing hotspot. Subsequently, the system stores the set of correction recommendations and the ranges of perturbation into a manufacturing hotspot database.

Abstract: A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.

Abstract: A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.

Abstract: A ventilation, temperature regulation, and ergonomic comfort system for a vehicle seat, comprising a cushion comprising a ventilation layer comprising non-woven plastic fibers fused together in such a manner as to permit airflow therethrough, the ventilation layer having a seat surface side and a reverse side, wherein the ventilation layer is disposed within a substantially air-tight compartment having an access hole for air input on the reverse side of the ventilation layer and a plurality of output holes on the seat surface side; an adjustable ergonomic support device, wherein the ergonomic support device is disposed on the reverse side of the ventilation layer and moves together with the cushion; a temperature regulation system comprising an air-moving device operably coupled to the access hole on the reverse side of the ventilation layer, such that the air-moving device moves conditioned air into the ventilation layer and out through the plurality of output holes; and a control module comprising controls

Abstract: In a method of entering text into an electronic communications device by means of a keypad having a number of keys, each key representing a plurality of letters and/or phonetic symbols, entered text is displayed on a display on the device. Possible phonetic syllables corresponding to an activated key sequence are generated. These are compared with a stored vocabulary comprising syllables and corresponding characters occurring in a given language. Those stored syllables and corresponding characters that match the possible syllables are pre-selected; and a number of these are presented in a separate first graphical object arranged predominantly on the display. Characters corresponding to one of the syllables in the first object are simultaneously presented in a second graphical object.