Patents by Inventor Daniela Anna Masciarelli

Daniela Anna Masciarelli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for selectively implanting dopants into the bottom of a deep trench
    Patent number: 6235610
    Abstract: A process for selectively introducing a dopant into the bottom of a trench formed in a semiconductor material layer includes depositing a barrier layer by a process of deposition over the semiconductor material layer to form a deposited barrier layer. The deposited barrier layer has, over lateral walls and a bottom wall of the trench, a thickness which is lower than a nominal thickness of the deposited barrier layer over a planar surface of the semiconductor material layer. The method also including implanting a dopant using the deposited barrier layer as an implant mask.
    Type: Grant
    Filed: December 28, 1998
    Date of Patent: May 22, 2001
    Assignee: STMicroelectronics S.R.L.
    Inventors: Maria Concetta Nicotra, Antonello Santangelo, Daniela Anna Masciarelli