Patents by Inventor Daniela Bayer

Daniela Bayer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9677874
    Abstract: A position-measuring device includes a first scale and a second scale, which are arranged end-to-end to extend across a measurement range, as well as a scanning unit having a light source configured to emit a light beam. The first scale includes a reflective phase grating having first periodic marks which diffract an incident light beam into a predetermined diffraction order with a first diffraction efficiency. The second scale includes a reflective phase grating having second periodic marks that differ in shape from the first periodic marks. A reflectivity of the phase grating of the second scale is reduced compared to a reflectivity of the phase grating of the first scale to such an extent that the phase grating of the second scale diffracts the incident light beam into the predetermined diffraction order with the first diffraction efficiency.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: June 13, 2017
    Assignee: DR. JOHANNES HEIDENHAIN GMBH
    Inventors: Peter Speckbacher, Tobias Gruendl, Josef Weidmann, Andrew Graham, Daniela Bayer
  • Publication number: 20160216103
    Abstract: A position-measuring device includes a first scale and a second scale, which are arranged end-to-end to extend across a measurement range, as well as a scanning unit having a light source configured to emit a light beam. The first scale includes a reflective phase grating having first periodic marks which diffract an incident light beam into a predetermined diffraction order with a first diffraction efficiency. The second scale includes a reflective phase grating having second periodic marks that differ in shape from the first periodic marks. A reflectivity of the phase grating of the second scale is reduced compared to a reflectivity of the phase grating of the first scale to such an extent that the phase grating of the second scale diffracts the incident light beam into the predetermined diffraction order with the first diffraction efficiency.
    Type: Application
    Filed: January 25, 2016
    Publication date: July 28, 2016
    Inventors: Peter Speckbacher, Tobias Gruendl, Josef Weidmann, Andrew Graham, Daniela Bayer