Abstract: A treatment process for the purpose of improving the chemical and/or physical durability of film containing one or more metallic oxides, nitrides, oxynitrides or oxycarbides deposited on a transparent substrate by a cathodic sputtering technique, notably assisted by a magnetic field and preferably reactive in the presence of oxygen. Said process consists of subjecting the film to a low energy ion beam.

Abstract: A method is provided for generating one or more differentiated zones of electrical conductivity or infrared emissivity in a thin semi-conducting layer of metallic oxide or oxides, comprising:subjecting the thin semi-conducting layer to an ion beam having sufficient energy to cause a change in electrical conductivity or infrared emissivity of the one or more zones without atomizing the thin semi-conducting layer, wherein the thin semi-conducting layer is at a high temperature during the subjecting step and the use of the method to prepare films for incorporation into transparent heating panes having uniform heating characteristics, especially for use in vehicles.