Abstract: An improved spin coating apparatus (10) having a spin tub (28) surrounding a chuck (14), the chuck (14) being adapted for hold a workpiece (16) for coating. The chuck (14) and the spin tub (28) are spun coaxially and independently such that the chuck (14) may be stopped while the spin tub (28) remains spinning. The spin tub (28) defines a frustum of a cone with a plurality of outlet slots (60) distributed at a large end (52) thereof such that centrifugal force will direct contaminants out of the spin tub (28) through the outlet slots (60). A plurality of fan vanes (62) create an air stream (88) through the spin tub (28) which pulls contaminants through the outlet slots (60) and into a plenum chamber (72) where they are expelled therefrom through a vent tube (64).

Abstract: A self enclosed filter pump system (10) is provided to deliver precise quantities of selected fluids. The system (10) includes a pump assembly (12) of a pneumatically controlled type and a modular filter and fluid bag assembly (14) adapted to mate with the pump assembly (12) during use. The filter and fluid bag assembly (14) is a flexible component which includes a container portion (20) for storing enclosed fluid (16) and an extension portion (22) for mating with the pump assembly (12). A series of fluid flow passages (35) create a fluid flow path from the storage chamber (34) to a first value bubble (36), a pump/filter bubble (46), a second valve bubble (52) and an outlet port (56). A filter membrane (48) may be secured within the pump/filter bubble (46) to filter the fluid (16) to remove particulate matter. The various bubbles (36, 46 and 52) are occluded and opened by pneumatic pressure applied to matching chambers (78, 88 and 94) in the pump housing (62).

Abstract: An object transport apparatus (10) is provided for the purpose of transporting an object (19), usually a semiconductor wafer, to various points within a planar circular zone (Z). The transport apparatus (10) includes a motive power subassembly (12) for generating rotational motion and delivering it to an arm subassembly (14) rotating about an elbow axis (20) and, through an eccentric drive subassembly (110) to a hand subassembly (16) adapted to support to wafer (19). The hand subassembly (16) rotates about a wrist axis (21) which is parallel to but displaced from the elbow axis (20) in an independent fashion from the rotation of the arm subassembly (14). The eccentric drive subassembly (110) incorporates complimentary pairs of cam drivers (111, 112) connected by cam linkages (120, 122) to deliver rotational motion from the elbow axis (20) to the wrist axis (21).

Abstract: A filter pump head assembly (10) is adapted for use with pneumatic pumping control systems. The assembly includes a rigid case subassembly (12) enclosing a chemically inert liner subassembly (14) which encloses a filter subassembly (16). The liner subassembly (14) includes a pneumatically deformable pumping membrane (72), the deformation of which varies the volume surrounding a filter cartridge (112). Various valves (33, 34 and 35) and ports are operated by selective pneumatic pressure on a top membrane (68). The control block (80) includes a bubble capture channel (94) which allows the bleeding of undesirable gas bubbles during use. The invention pump of the various disclosed embodiments is particularly adapted to pump and filter ultrapure, reactive fluids varying viscosities at a low pumping pressure. The primary current commercial usage of the invention is in the semiconductor manufacturing industry.