Patents by Inventor Danny KUO

Danny KUO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11926017
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Grant
    Filed: May 5, 2021
    Date of Patent: March 12, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Charlie Wang, Yu-Ping Tseng, Y. J. Chen, Wai-Ming Yeung, Chien-Shen Chen, Danny Kuo, Yu-Hsuan Hsieh, Hsuan Lo
  • Publication number: 20210252668
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Application
    Filed: May 5, 2021
    Publication date: August 19, 2021
    Inventors: Charlie WANG, Yu-Ping TSENG, Y.J. CHEN, Wai-Ming YEUNG, Chien-Shen CHEN, Danny KUO, Yu-Hsuan HSIEH, Hsuan LO
  • Patent number: 11007620
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: May 18, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Charlie Wang, Yu-Ping Tseng, Y. J. Chen, Wai-Ming Yeung, Chien-Shen Chen, Danny Kuo, Yu-Hsuan Hsieh, Hsuan Lo
  • Publication number: 20190143481
    Abstract: A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.
    Type: Application
    Filed: March 29, 2018
    Publication date: May 16, 2019
    Inventors: Charlie WANG, Yu-Ping TSENG, Y.J. CHEN, Wai-Ming YEUNG, Chien-Shen CHEN, Danny KUO, Yu-Hsuan HSIEH, Hsuan LO