Patents by Inventor Danny Maria Hubertus Philips

Danny Maria Hubertus Philips has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 11143968
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 12, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista
  • Lithographic apparatus
    Patent number: 10649341
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: May 12, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Clemens Johannes Gerardus Van Den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
  • LITHOGRAPHIC APPARATUS
    Publication number: 20170023870
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Application
    Filed: October 6, 2016
    Publication date: January 26, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
  • ROTATABLE FRAME, LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM, METHOD FOR FOCUSING RADIATION AND DEVICE MANUFACTURING METHOD
    Publication number: 20160349628
    Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.
    Type: Application
    Filed: August 12, 2016
    Publication date: December 1, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan BLEEKER, Thomas Josephus Maria CASTENMILLER, Pieter Willem Herman DEJAGER, Heine Melle MULDER, Koen Jacobus Johannes ZAAL, Theodorus Petrus Maria CADEE, Danny Maria Hubertus PHILIPS, Ruud Antonius Catharina Maria BEERENS, Roger Anton Marie TIMMERMANS
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160306283
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Application
    Filed: June 29, 2016
    Publication date: October 20, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria DIRECKS, Sjoerd Nicolaas Lambertus DONDERS, Nicolaas Rudolf KEMPER, Danny Maria Hubertus PHILIPS, Michel RIEPEN, Clemens Johannes Gerardus VAN DEN DUNGEN, Adrianes Johannes BAETEN, Fabrizio EVANGELISTA
  • Lithographic apparatus
    Patent number: 9465302
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Grant
    Filed: May 5, 2015
    Date of Patent: October 11, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus Van Den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 9383654
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: July 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista
  • LITHOGRAPHIC APPARATUS
    Publication number: 20150234294
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Application
    Filed: May 5, 2015
    Publication date: August 20, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Nicolaas Franciscus KOPPELAARS, Martinus Hendrikus Antonius LEENDERS, Paulus Martinus Maria LIEBREGTS, Johannes Catharinus Hubertus MULKENS, Erik Henricus Egidius Catharina EUMMELEN, Marcel BECKERS, Richard MOERMAN, Cédric Désiré GROUWSTRA, Danny Maria Hubertus PHILIPS, Remko Jan Peter VERHEES, Pieter MULDER, Evert VAN VLIET
  • Lithographic apparatus
    Patent number: 9036127
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: May 19, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus Van den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
  • Rotatable Frame For a Lithographic Apparatus
    Publication number: 20150034788
    Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.
    Type: Application
    Filed: January 30, 2013
    Publication date: February 5, 2015
    Inventors: Arno Jan Bleeker, Thomas Josephus Maria Castenmill, Pieter Willem Herman De Jager, Heine Melle Mulder, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Danny Maria Hubertus Philips, Ruud Antonius Catharina Maria Beere, Roger Anton Marie Timmermans
  • Lithographic apparatus and device manufacturing method
    Patent number: 8797504
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: August 5, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
  • LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140192337
    Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.
    Type: Application
    Filed: July 24, 2012
    Publication date: July 10, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Danny Maria Hubertus Philips, Ruud Antonius Catharina Maria Beerens
  • Lithographic apparatus and device manufacturing method
    Patent number: 8730448
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: May 20, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
  • Fluid handling structure, lithographic apparatus and a device manufacturing method
    Patent number: 8638417
    Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.
    Type: Grant
    Filed: April 12, 2011
    Date of Patent: January 28, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Marcus Johannes Van Der Zanden, Pieter Mulder
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8508712
    Abstract: A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: August 13, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Clemens Johannes Gerardus Van Den Dungen, Danny Maria Hubertus Philips, Koen Steffens, Tijmen Wilfred Mathijs Gunther, David Bessems
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8421993
    Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: April 16, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Koen Steffens, Arnold Jan Van Putten
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8405815
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: March 26, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Danny Maria Hubertus Philips, Daniel Jozef Maria Direcks, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8351018
    Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.
    Type: Grant
    Filed: May 6, 2009
    Date of Patent: January 8, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Koen Steffens, Arnold Jan Van Putten
  • Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
    Patent number: 8345218
    Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: January 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120229782
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Application
    Filed: February 29, 2012
    Publication date: September 13, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Anges Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Olesksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux