Abstract: A battery includes a first chamber with a first electrode and a second chamber with a second electrode. An intercalation membrane between the first chamber and the second chamber is configured to retain an electrolyte in the first chamber and to accept therein migrating ions of the electrolyte in the presence of an electrical field and lose mechanical integrity permitting the electrolyte to enter the second chamber in order to activate the battery.

Abstract: A method of manufacturing a corrugated copper microwave waveguide comprising placing a mandrel with external corrugations in an electrolyte bath substantially devoid of brighteners, accelerators, or levelers and including copper ions, sulfuric acid, chloride, and polyethylene glycol. The mandrel is placed proximate a copper anode in the bath. One or more waveforms are applied to the mandrel and anode to control electrodeposition distribution of copper to the mandrel rather than controlling the electrolyte bath chemistry. The mandrel and the resulting electroformed waveguide are removed from the electrolyte bath and the mandrel is excised (e.g., dissolved) resulting in a microwave waveguide with internal corrugations. Substantially devoid of additives (brighteners, accelerators, and/or levelers) generally means not having to repeatedly meter in additives during the electroforming process.

Abstract: A method of coating a substrate includes adding ion erosion resistant particles, conductive particles, and a binder to an electrophoretic solution in an electrophoretic deposition apparatus including the substrate and a cathode spaced from the substrate. A current is applied to the substrate and cathode to deposit a first layer coating including the erosion resistant particles, the conductive particles, and the binder onto the substrate. The method further includes adding a low work function material to an electrolyte solution in an electrolytic deposition apparatus including the substrate and a cathode spaced from the substrate. A current is applied to the substrate and the cathode to deposit a second layer coating including the low work function material onto the substrate.

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.

Abstract: The problem of high rate electrodeposition of metals such as copper during electrowinning operations or high rate charging of lithium or zinc electrodes for rechargeable battery applications while avoiding the adverse effects of dendrite formation such as causing short-circuiting and/or poor deposit morphology is solved by pulse reverse current electrodeposition or charging whereby the forward cathodic (electrodeposition or charging) pulse current is “tuned” to minimize dendrite formation for example by creating a smaller pulsating boundary layer and thereby minimizing mass transport effects leading to surface asperities and the subsequent reverse anodic (electropolishing) pulse current is “tuned” to eliminate the micro- and macro-asperities leading to dendrites.