Patents by Inventor Daria Nevstrueva

Daria Nevstrueva has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230203644
    Abstract: In some embodiments, methods are provided for simultaneously and selectively depositing a first material on a first surface of a substrate and a second, different material on a second, different surface of the same substrate using the same reaction chemistries. For example, a first material may be selectively deposited on a metal surface while a second material is simultaneously and selectively deposited on an adjacent dielectric surface. The first material and the second material have different material properties, such as different etch rates.
    Type: Application
    Filed: February 16, 2023
    Publication date: June 29, 2023
    Inventors: Michael Eugene Givens, Eva Tois, Suvi Haukka, Daria Nevstrueva, Charles Dezelah
  • Patent number: 11608557
    Abstract: In some embodiments, methods are provided for simultaneously and selectively depositing a first material on a first surface of a substrate and a second, different material on a second, different surface of the same substrate using the same reaction chemistries. For example, a first material may be selectively deposited on a metal surface while a second material is simultaneously and selectively deposited on an adjacent dielectric surface. The first material and the second material have different material properties, such as different etch rates.
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: March 21, 2023
    Assignee: ASM IP HOLDING B.V.
    Inventors: Michael Eugene Givens, Eva Tois, Suvi Haukka, Daria Nevstrueva, Charles Dezelah
  • Publication number: 20210301391
    Abstract: In some embodiments, methods are provided for simultaneously and selectively depositing a first material on a first surface of a substrate and a second, different material on a second, different surface of the same substrate using the same reaction chemistries. For example, a first material may be selectively deposited on a metal surface while a second material is simultaneously and selectively deposited on an adjacent dielectric surface. The first material and the second material have different material properties, such as different etch rates.
    Type: Application
    Filed: March 29, 2021
    Publication date: September 30, 2021
    Inventors: Michael Eugene Givens, Eva Tois, Suvi Haukka, Daria Nevstrueva, Charles Dezelah