Patents by Inventor Dario Elyasi

Dario Elyasi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical metrology for in-situ measurements
    Patent number: 10197506
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Grant
    Filed: March 8, 2018
    Date of Patent: February 5, 2019
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Igor Turovets, Cornel Bozdog, Dario Elyasi
  • OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS
    Publication number: 20180195975
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Application
    Filed: March 8, 2018
    Publication date: July 12, 2018
    Inventors: Igor TUROVETS, Cornel BOZDOG, Dario ELYASI
  • Optical metrology for in-situ measurements
    Patent number: 9915624
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: March 13, 2018
    Assignee: NOVA MEASURING INSTRUMENTS, LTD.
    Inventors: Igor Turovets, Cornel Bozdog, Dario Elyasi
  • OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS
    Publication number: 20170167987
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 15, 2017
    Inventors: Igor TUROVETS, Cornel BOZDOG, Dario ELYASI
  • Optical metrology for in-situ measurements
    Patent number: 9528946
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Grant
    Filed: August 15, 2013
    Date of Patent: December 27, 2016
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Igor Turovets, Cornel Bozdog, Dario Elyasi
  • OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS
    Publication number: 20150226680
    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure.
    Type: Application
    Filed: August 15, 2013
    Publication date: August 13, 2015
    Inventors: Igor Turovets, Cornel Bozdog, Dario Elyasi