Patents by Inventor Darith Kong

Darith Kong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas Manifold for Simultaneous Gas Property Control in Deposition Systems
    Publication number: 20250137130
    Abstract: A gas manifold includes a gas inlet surface having a first and second gas input port and a gas outlet surface. A first internal chamber is coupled to the first gas input port. A first plurality of gas conduits, each including an input coupled to the first internal chamber and an outlet at the gas outlet surface where a direction of at least one of the conduits in the first plurality of gas conduits relative to the gas outlet surface is different. A second internal chamber is coupled to the second gas input port and is isolated from the first internal chamber. A second plurality of gas conduits, each including an input coupled to the second internal chamber and an outlet at the gas outlet surface. A direction of at least one of the conduits in the second plurality of gas conduits relative to the gas outlet surface is different.
    Type: Application
    Filed: December 28, 2024
    Publication date: May 1, 2025
    Applicant: Arradiance, LLC
    Inventors: David R. Beaulieu, Jeffrey D. McHugh, Michael D. Trotter, Darith Kong
  • Gas manifold for simultaneous gas property control in deposition systems
    Patent number: 12215423
    Abstract: A gas manifold includes a gas inlet surface having a first and second gas input port and a gas outlet surface. A first internal chamber is coupled to the first gas input port. A first plurality of gas conduits, each including an input coupled to the first internal chamber and an outlet at the gas outlet surface where a direction of at least one of the conduits in the first plurality of gas conduits relative to the gas outlet surface is different. A second internal chamber is coupled to the second gas input port and is isolated from the first internal chamber. A second plurality of gas conduits, each including an input coupled to the second internal chamber and an outlet at the gas outlet surface. A direction of at least one of the conduits in the second plurality of gas conduits relative to the gas outlet surface is different.
    Type: Grant
    Filed: February 28, 2022
    Date of Patent: February 4, 2025
    Assignee: Arradiance, LLC
    Inventors: David R. Beaulieu, Jeffrey D. McHugh, Michael D. Trotter, Darith Kong
  • Gas Manifold for Simultaneous Gas Property Control in Deposition Systems
    Publication number: 20230272531
    Abstract: A gas manifold includes a gas inlet surface having a first and second gas input port and a gas outlet surface. A first internal chamber is coupled to the first gas input port. A first plurality of gas conduits, each including an input coupled to the first internal chamber and an outlet at the gas outlet surface where a direction of at least one of the conduits in the first plurality of gas conduits relative to the gas outlet surface is different. A second internal chamber is coupled to the second gas input port and is isolated from the first internal chamber. A second plurality of gas conduits, each including an input coupled to the second internal chamber and an outlet at the gas outlet surface. A direction of at least one of the conduits in the second plurality of gas conduits relative to the gas outlet surface is different.
    Type: Application
    Filed: February 28, 2022
    Publication date: August 31, 2023
    Applicant: Arradiance, LLC
    Inventors: David R. Beaulieu, Jeffrey D. McHugh, Michael D. Trotter, Darith Kong