Abstract: The invention relates to method and system configured for material analysis and mineralogy. At least one image based on first emission from a sample is provided. First spectra of the sample based on second emissions from the second scan locations of the image are provided. A confidence score is calculated for every first spectrum, and second scan location(s) with confidence score(s) below a threshold value are selected. Second emissions from the selected second scan location(s) are acquired to provide new image and determine new second scan locations within the respective new image.

Abstract: A scanning microscope system configured for material analysis and mineralogy comprising a first detector and a second detector, and a data-processing system comprising a data-storage component and a segmentation component. The data-storage component is configured for providing image(s) of a sample based on first emissions from a plurality of first scan locations. The segmentation component is configured for determining at least one or a plurality of second scan locations for at least one or a plurality of region(s) of the at least one image. The second detector is configured for detecting second emissions from at least one of the second scan locations of at least one of the regions. The system is further configured for determining the second scan location(s) for the region(s) and detecting the second emissions from the at least one of the second scan locations of the at least one of the regions in parallel.

Abstract: Method for determining properties of a sample and a charged particle system for implementing the method are disclosed. The method includes providing at least one image of the sample based on first emissions from a plurality of first scan locations; determining at least one or a plurality of second scan location(s) for at least one or a plurality of region(s) of the at least one image; detecting second emissions from at least one of the second scan locations of at least one of the regions; and adjusting a second dwell period with respect to an average segmentation dwell period.