Abstract: Apparatus and method for inhibiting the image of a transparent, undesired feature on a reticle from printing on semiconductor material. The apparatus includes a frame attachment connected to a pellicle frame that is attached to a reticle. A blade that is opaque to ultraviolet light is moveable across the frame attachment and may be positioned proximate the undesired feature of the reticle to prevent the printing of the image of the undesired feature on the semiconductor material. The blade may be positioned above the undesired feature to inhibit ultraviolet light from an illumination source from impinging upon the undesired feature. Alternatively, the blade may be positioned below the undesired feature to inhibit ultraviolet light passing through the undesired feature from impinging upon the semiconductor material.

Abstract: An apparatus and method for removing particles and reducing temperature within an equipment unit, such as a photolithography stepper unit. The equipment unit is located in a clean room environment. The clean room environment contains environmental gases and is defined by four walls, a floor, and a ceiling. At least one of the four walls is hollow forming an air chase. Outside air is circulated in the air chase. A hole in the wall containing the air chase allows communication between the clean room environment and the air chase. A skirt is connected to the equipment unit and the floor, and a shroud is connected to the skirt, the floor, and the hole. The skirt and the shroud substantially seal the equipment unit with the hole to allow environmental gases within the equipment unit to be drawn within the equipment unit to the air chase.