Abstract: A shutter apparatus for use in a part-manufacturing process is disclosed. The shutter apparatus includes a platen having a plurality of substrate locations. The shutter apparatus also includes a shutter defining a substrate-location aperture. The shutter covers the platen except for a selectable one of the plurality of substrate locations of the platen exposed through the substrate-location aperture. The substrate-location aperture is sized to expose only one of the plurality of substrate locations at a time, such that the shutter covers all but a selected one of the plurality of substrate locations. The shutter and the platen are selectively rotatable, relative to each other, to alternatingly expose a different selected one of the plurality of substrate locations.

Abstract: An apparatus measures the transverse profile of vectorial optical field beams, including both the phase and the polarization spatial profile. The apparatus contains a polarization separation module, a weak perturbation module, and a detection module. Characterizing the transverse profile of vector fields provides an optical metrology tool for both fundamental studies of vectorial optical fields and a wide spectrum of applications, including microscopy, surveillance, imaging, communication, material processing, and laser trapping.

Abstract: An apparatus measures the transverse profile of vectorial optical field beams, including both the phase and the polarization spatial profile. The apparatus contains a polarization separation module, a weak perturbation module, and a detection module. Characterizing the transverse profile of vector fields provides an optical metrology tool for both fundamental studies of vectorial optical fields and a wide spectrum of applications, including microscopy, surveillance, imaging, communication, material processing, and laser trapping.

Abstract: An apparatus measures the transverse profile of vectorial optical field beams, including both the phase and the polarization spatial profile. The apparatus contains a polarization separation module, a weak perturbation module, and a detection module. Characterizing the transverse profile of vector fields provides an optical metrology tool for both fundamental studies of vectorial optical fields and a wide spectrum of applications, including microscopy, surveillance, imaging, communication, material processing, and laser trapping.

Abstract: An apparatus measures the transverse profile of vectorial optical field beams, including both the phase and the polarization spatial profile. The apparatus contains a polarization separation module, a weak perturbation module, and a detection module. Characterizing the transverse profile of vector fields provides an optical metrology tool for both fundamental studies of vectorial optical fields and a wide spectrum of applications, including microscopy, surveillance, imaging, communication, material processing, and laser trapping.