Patents by Inventor Darryl Bennett

Darryl Bennett has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation
    Patent number: 6676800
    Abstract: A method and apparatus for cleaning semiconductor wafers, next generation lithography (NGL) masks, and optical photomasks as well as test wafers and in service NGL and optical masks is disclosed. The method and apparatus utilize reactive gases and gas mixtures and mechanical agitation to enhance particle removal. The addition of a reactive gas process to an inert gas feed enhances the plasma cleaning process by breaking chemical bonds which form between surface particles and a substrate, consequently improving cleaning efficiency.
    Type: Grant
    Filed: March 15, 2000
    Date of Patent: January 13, 2004
    Assignee: Applied Materials, Inc.
    Inventors: John J. Festa, Darryl Bennett, Joel Brad Bailey, Lawrence J. Overzet, Marwan H. Khater, Siva K. Kanakasabapathy