Patents by Inventor Datong ZHANG

Datong ZHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250027990
    Abstract: Systems and methods of inspecting a sample using a charged-particle beam apparatus with enhanced probe current and high current density of the primary charged-particle beam are disclosed. The apparatus includes a charged-particle source, a first condenser lens configured to condense the primary charged-particle beam and operable in a first mode and a second mode, wherein: in the first mode, the first condenser lens is configured to condense the primary charged-particle beam, and in the second mode, the first condenser lens is configured to condense the primary charged-particle beam sufficiently to form a crossover along the primary optical axis. The apparatus further includes a second condenser lens configured to adjust a first beam current of the primary charged-particle beam in the first mode and adjust a second beam current of the primary charged-particle beam in the second mode, the second beam current being larger than the first beam current.
    Type: Application
    Filed: October 26, 2022
    Publication date: January 23, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Datong ZHANG, Xiaoyu JI, Weiming REN, Xuedong LIU, Chia Wen LIN
  • Publication number: 20240153732
    Abstract: Apparatuses, systems, and methods for providing beams for using deflector control to control charging on a sample surface of charged particle beam systems. In some embodiments, a controller including circuitry configured to scan a plurality of nodes of the sample to charge the plurality of nodes; adjust a scan rate of a beam such that a quantity of charge deposited on each node of the plurality of nodes varies with respect to at least one other node; generate a plurality of images; and compare the plurality of images to enable detection of a defect associated with any of the plurality of nodes of the sample.
    Type: Application
    Filed: February 9, 2022
    Publication date: May 9, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Datong ZHANG, Chih-hung WANG, Oliver Desmond PATTERSON, Xiaohu TANG
  • Publication number: 20230298851
    Abstract: A charged particle beam apparatus for inspecting a sample is provided. The apparatus includes a pixelized electron detector to receive signal electrons generated in response to an incidence of an emitted charged particle beam onto the sample. The pixelized electron detector includes multiple pixels arranged in a grid pattern. The multiple pixels may be configured to generate multiple detection signals, wherein each detection signal corresponds to the signal electrons received by a corresponding pixel of the pixelized electron detector. The apparatus further includes a controller includes circuitry configured to determine a topographical characteristic of a structure within the sample based on the detection signals generated by the multiple pixels, and identifying a defect within the sample based on the topographical characteristic of the structure of the sample.
    Type: Application
    Filed: July 26, 2021
    Publication date: September 21, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Chih-Yu JEN, Chien-Hung CHEN, Long MA, Bruno LA FONTAINE, Datong ZHANG
  • Publication number: 20230109695
    Abstract: Some embodiments are related to a method of or apparatus for forming an image of a buried structure that includes: emitting primary charged particles from a source; receiving a plurality of secondary charged particles from a sample; and forming an image based on received secondary charged particles that have an energy within a first range.
    Type: Application
    Filed: October 12, 2022
    Publication date: April 13, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Xuechen ZHU, Farshid TAZESH, Datong ZHANG, Weiming REN