Patents by Inventor Dave Ballance

Dave Ballance has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for non-destructive distribution profiling of an element in a film
    Publication number: 20080283743
    Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.
    Type: Application
    Filed: July 25, 2008
    Publication date: November 20, 2008
    Inventors: Paola deCecco, Bruno Schueler, David Reed, Michael Kwan, Dave Ballance
  • Method and system for non-destructive distribution profiling of an element in a film
    Patent number: 7411188
    Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: August 12, 2008
    Assignee: ReVera Incorporated
    Inventors: Paola deCecco, Bruno Schueler, David Reed, Michael Kwan, Dave Ballance
  • Method and system for non-destructive distribution profiling of an element in a film
    Publication number: 20070010973
    Abstract: A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.
    Type: Application
    Filed: August 31, 2005
    Publication date: January 11, 2007
    Inventors: Paola deCecco, Bruno Schueler, David Reed, Michael Kwan, Dave Ballance