Abstract: The invention relates to a bakeware, cookware and/or grillware item comprising a base, a heating side (14) arranged at a first side of the base (B), and a cooking side (12) arranged at a second side of the base (B), with the cooking side (12) being oppositely disposed to the heating side (14), wherein at least the cooking side (12) comprises a layer structure (LS) comprising at least a functional layer (FL), with the functional layer (FL) comprising a composition of CrXN1-X, where 0.5<X?0.95 and a hardness selected in the range of 10 to 30 GPa, and a thickness selected in the range of 0.1 to 5 ?m. The invention further relates to a method of coating bakeware, cookware and/or grillware items, a carrier for a coating device (100) for coating bakeware, cookware and/or grillware items and a coating device.

Abstract: The present invention relates to a method of coating one or more metal components of a fuel cell stack, such as a bipolar plate, an electrode, gaskets etc., the method comprising the steps of providing an uncoated metal component; etching said uncoated metal component; optionally depositing an adhesion layer on the etched uncoated metal component; and depositing a carbon coating on either the adhesion layer or on the etched uncoated metal component, with the adhesion layer and the carbon coating respectively being deposited by means of one of a physical vapor deposition process, an arc ion plating process, a sputtering process, and a Hipims process. The invention further relates to a component of a fuel cell stack and to an apparatus for coating one or more components of a fuel cell stack.

Abstract: The present invention relates to a method of coating one or more metal components of a fuel cell stack, such as a bipolar plate, an electrode, gaskets etc., the method comprising the steps of providing an uncoated metal component; etching said uncoated metal component; optionally depositing an adhesion layer on the etched uncoated metal component; and depositing a carbon coating on either the adhesion layer or on the etched uncoated metal component, with the adhesion layer and the carbon coating respectively being deposited by means of one of a physical vapor deposition process, an arc ion plating process, a sputtering process, and a Hipims process. The invention further relates to a component of a fuel cell stack and to an apparatus for coating one or more components of a fuel cell stack.

Abstract: An apparatus for coating substrates includes a vacuum chamber having an opening through which substrates can be received and a door configured to seal the opening; one or more targets arranged in the vacuum chamber; a cooling unit configured to cool the substrates and/or a heating unit configured to heat the substrates; rotating means configured to rotate substrates relative to the one or more targets, the cooling unit and/or the heating unit; and a lifting chamber that communicates with the interior of the vacuum chamber and is configured to receive the cooling unit and the heating unit. The vacuum chamber defines a lifting axis along which the cooling unit and/or the heating unit and the lifting chamber are arranged, and the apparatus further comprises displacement means configured to displace the cooling unit and/or the heating unit along the lifting axis and between the vacuum chamber and the lifting chamber.

Abstract: An apparatus for coating substrates includes a vacuum chamber having an opening through which substrates can be received and a door configured to seal the opening; one or more targets arranged in the vacuum chamber; a cooling unit configured to cool the substrates and/or a heating unit configured to heat the substrates; rotating means configured to rotate substrates relative to the one or more targets, the cooling unit and/or the heating unit; and a lifting chamber that communicates with the interior of the vacuum chamber and is configured to receive the cooling unit and the heating unit. The vacuum chamber defines a lifting axis along which the cooling unit and/or the heating unit and the lifting chamber are arranged, and the apparatus further comprises displacement means configured to displace the cooling unit and/or the heating unit along the lifting axis and between the vacuum chamber and the lifting chamber.

Abstract: A metal doped carbon coating wherein the Me-doped C coating is for operation in boundary lubrication conditions, in which the metal is present in the coating in an amount of from 5 to 20% by atomic percent, i.e. the ratio of the number of atoms of the metal Me to the number of atoms of the carbon C does not exceed 1:4. The coating is made by pre-treating a workpiece surface by simultaneous bombardment of the surface with accelerated ions of W, Mo and C ions generated by a HIPIMS discharge in a treatment chamber. This is followed by deposition of a transition layer of metal and/or metal nitride of a thickness in the range from 20 nm-1000 nm thick by magnetron sputtering optionally in the form of or including HIPIMS sputtering, the metal being at least one of W and Mo. Thereafter a main layer the main layer of Me-doped C coating is deposited by HIPIMS sputtering.

Abstract: A vacuum treatment apparatus (10) for treating at least one substrate (12) and comprising a treatment chamber (14), at least one cathode (16), a power supply (18) associated with the cathode for generating ions of a material present in the gas phase in the chamber and/or ions of a material of which the cathode is formed, a substrate carrier (20) and a bias power supply for applying a negative bias to the substrate carrier and any substrate present thereon, whereby to attract said ions to said at least one substrate, said cathode power supply being adapted to apply relatively high power pulses of relatively short duration to said cathode at intervals resulting in lower average power levels comparable with DC operation, e.g. in the range from ca.

Abstract: The invention relates to a device for the plasma and/or coating treatment of workpieces comprising a chamber (2) that can be evacuated, a holding device (3) for the workpieces to be treated that is rotatably mounted within the chamber (2) and a plasma source (4). In order to create a device of the above mentioned type that enables the treatment of relatively great workpieces with respect to the size of the device, the invention proposes that the plasma source (4) is placed within the chamber (2), for which purpose the at least one cathode (5) and the least one anode (6) of the plasma source (4) are mounted on the upper side or lower side (7, 8) inside the chamber (2).