Abstract: An apparatus and method for suspending a substantial portion of a quilt or fabric for free-motion stitching during sewing operations is disclosed. The apparatus includes a planar frame with support poles extending from the frame feet, with a retainer for retaining a portion of the quilt or fabric attached to one or more support poles via a retainer block. The frame includes at least two frame base portions with frame feet on opposing sides of the frame base portions which form a secure base for the suspension assembly to rest upon a surface. A dowel spans between the frame feet of each frame base and serves to provide a sturdy structural connection to which the support poles are attached. The retention clips retain the quilt or fabric layers in the desired suspended position so as to form a partial paraboloid shape with the local area around the vertex of the partial paraboloid shape positioned in relative juxtaposition to the sewing machine needle where stitching occurs.

Abstract: An apparatus and method for suspending a substantial portion of a quilt or fabric for free-motion stitching during sewing operations is disclosed. The apparatus includes a planar frame with support poles extending from the frame feet, with a retainer for retaining a portion of the quilt or fabric attached to one or more support poles via a retainer block. The frame includes at least two frame base portions with frame feet on opposing sides of the frame base portions which form a secure base for the suspension assembly to rest upon a surface. A dowel spans between the frame feet of each frame base and serves to provide a sturdy structural connection to which the support poles are attached. The retention clips retain the quilt or fabric layers in the desired suspended position so as to form a partial paraboloid shape with the local area around the vertex of the partial paraboloid shape positioned in relative juxtaposition to the sewing machine needle where stitching occurs.

Abstract: Methods and apparatus for plasma processing of a substrate to improve process results are proposed. The apparatus pertains to multi-layer segmented electrodes and methods to form and operate such electrodes. The multi-layer segmented electrode includes a first layer comprising a first plurality of electrode segments, whereby electrode segments of the first plurality of electrode segments spatially separated from one another along a first direction. There is also included a second layer comprising a second plurality of electrode segments, whereby the second layer is spatially separated from the first layer along a second direction perpendicular to the first direction and whereby at least two segmented electrodes of the first plurality of electrode segments are individually controllable with respect to one or more electrical parameters.

Abstract: Methods and apparatus for plasma processing of a substrate to improve process results are proposed. The apparatus pertains to multi-layer segmented electrodes and methods to form and operate such electrodes. The multi-layer segmented electrode includes a first layer comprising a first plurality of electrode segments, whereby electrode segments of the first plurality of electrode segments spatially separated from one another along a first direction. There is also included a second layer comprising a second plurality of electrode segments, whereby the second layer is spatially separated from the first layer along a second direction perpendicular to the first direction and whereby at least two segmented electrodes of the first plurality of electrode segments are individually controllable with respect to one or more electrical parameters.