Abstract: Aspects of the present disclosure provide a method for correcting an overlay error by shifting lithographic patterns to be formed on a wafer according to a bow measurement of the wafer. For example, the method can include receiving a first location at which one or more first semiconductor elements are to be formed on a first wafer, measuring the first wafer to identify a first bow measurement of the first wafer, calculating a second location that is shifted from the first location based on the first bow measurement, and forming the first semiconductor elements on the first wafer at the second location.

Abstract: Disclosed herein are drug delivery punctal implants and methods of using the implants for the treatment of ocular disorders requiring targeted and controlled administration of a drug to an interior portion of the eye for reduction or prevention of symptoms of the disorder. The physical arrangement of drugs within the punctal plugs disclosed herein results, in several embodiments, in advantageous controlled delivery of one or more drugs to the eye of a patient.