Patents by Inventor Dave Rath

Dave Rath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Particle removal with minimal etching of silicon-germanium
    Publication number: 20160181087
    Abstract: Particle-clean formulations and methods for semiconductor substrates use aqueous solutions of tetraethylammonium hydroxide (“TEAH,” C8H21NO) with or without hydrogen peroxide (H2O2). The solution pH ranges from 8-12.5. At process temperatures between 20-70 C, the TEAH solutions have been observed to remove particles from silicon-germanium (SiGe) with 20-99% Ge content in 15-300 seconds with very little etching (SiGe etch rates<1 nm/min).
    Type: Application
    Filed: December 19, 2014
    Publication date: June 23, 2016
    Inventors: John Foster, Steven Bentley, Sean Lin, Dave Rath, Muthumanickam Sankarapandian, Ruilong Xie