Abstract: A vacuum tube that may include but is not limited to a plurality of electrodes. A first electrode of the plurality of electrodes may be configured to operatively connect to an electrical source. A second electrode of the plurality of electrodes may be configured to operatively connect to a first load of a plurality of loads, wherein the first electrode may be configured to complete a first circuit through the second electrode and the first load. A third electrode of the plurality of electrodes may be configured to operatively connect to a second load of the plurality of loads that is independent from the first load, wherein the first electrode may be configured to complete a second circuit through the third electrode and the second load.

Abstract: An apparatus for a first electrode and a second electrode. The first and second electrode support an arc that conducts electric current between the first and second electrode. A shape of at least one of the first and second electrode, after an arc is established between the first and second electrode, expand at least one of an arc footprint of the arc on at least one of the first and second electrode and an arc column of the arc between the first and second electrode as the electric current between the first and second electrode increases.

Abstract: A method and apparatus for a capacitor comprises a first plate and a second plate. An insulator between the first plate and the second plate includes a first dielectric layer and a second dielectric layer. At least one interface between the first dielectric layer and the second dielectric layer includes one or more additives.

Abstract: Methods for depositing an amorphous vanadium oxide (VOx) film include vaporizing vanadium from a vanadium source while the a gas containing an oxygen species and a process modifying additive are in the chamber so as to deposit an amorphous VOx film on the substrate, where x>0. The process modifying additive includes a gas flowing into the chamber or vaporized material from a target source. The additive may stabilize the deposition rate of VOx, reduce resistivity, improve thickness control, and improve uniformity of thickness and resistivity. The thin film may be a nitrogen-enhanced, amorphous vanadium oxide (VOxNy) film formed on a substrate, where x>y>0, and the film contains at least 0.2 atomic % nitrogen. The film may be used in a device, such as a thermal or infrared sensor, or more particularly a bolometer.

Abstract: In accordance with one specific embodiment of the present invention, a Hall-current ion source is operated in a pulsed mode where the pulse duration is short compared to the time for discharge fluctuations to develop. For a reduced loss of neutral gas, the time between pulses should be less than, or about equal to, the fill time for the ionizable gas in the discharge volume of the Hall-current ion source.

Abstract: In one embodiment of this invention, the apparatus for sputter deposition within an evacuated volume comprises a compact gridless ion source into which an ionizable gas is introduced and from which ions leave with directed energies at or near the sputtering threshold and a sputter target near that source, biased negative relative to the surrounding vacuum enclosure, and located within the beam of ions leaving that source. Particles sputtered from the target are deposited on a deposition substrate spaced from both the ion source and the sputter target. An energetic beam of electrons can be generated by the incident ions striking the negatively biased sputter target and the deposition substrate is located either within or outside of this beam, depending on whether the net effect of bombardment by energetic electrons is beneficial or detrimental to that particular deposition process.

Abstract: In accordance with one specific embodiment of the present invention, the apparatus for sputter deposition within an evacuated volume comprises a compact ion source to generate ions into which an ionizable gas is introduced and from which ions leave with directed energies near or below the sputtering threshold, a sputter target near that source and located within the beam of ions leaving that source, a sputter target with a grounded shield that defines the target portion exposed to sputtering, and a power supply to bias the target negative relative to ground so that ions are attracted to and sputter the target. Particles sputtered from the target are deposited on a deposition substrate separate from both the ion source and the sputter target. For an insulating target, the target is biased with a radiofrequency power supply and the bias has a mean negative value rather than a direct-current negative value relative to ground.

Abstract: The ensoBox™ is an Internet Service Provider (ISP) appliance. An Internet appliance can be classified as a ready-to-use device that supports a specific Internet requirement. The software to support this appliance is pre-installed in the factory, is typically proprietary in nature, and is purchased in conjunction with the associated hardware. An appliance supports a plug-and-play configuration to allow for easy installation and management by the appliance's owner. An Internet appliance does not require the separate purchase of hardware and software, and then the subsequent systems integration by the owner.

Abstract: Disclosed is a method that defines a standard configuration useful for scaling services independently. This method makes efficient use of the Network, Server and Storage layers of a computing infrastructure in such a way that services can be clustered. These clustered services allow for redundancy in hardware and software and take full advantage of the hardware and software to increase customer performance and throughput. By making appropriate use of inexpensive servers, network attached storage, virtual local area networks, content switching and service clustering, Internet services can be scaled incrementally as customer demand grows. This method is efficient and relatively affordable.

Abstract: A system for defining, implementing, and maintaining geographically disperse Internet Service Providers (ISP) from a centralized processing center. Customers of ISP are provisioned services that include, but are not limited to, internet access, e-mail access, and web-hosting space. System provides ability to define flexible service offerings at price points dependent on disparate market conditions. Further, the system generates billing data based on specified service offerings that is aggregated and presented to the customer in a formatted bill in local currency and in accordance to local customs. Collection for services rendered is performed by the system in conjunction with third party processing systems in local currencies.

Abstract: An electromagnet that produces a uniaxial magnetic field for magnetically orienting thin films on a substrate in a low-pressure processing environment is arranged with a plate-shaped core having a circular periphery and an electromagnetic coil having windings that are arranged in a pattern across a front side of the core for reducing skew of the uniaxial magnetic field. The individual windings include lengths divided in different proportions between straight center sections and two bent end sections. The straight sections of the windings, which extend normal to a winding axis, incrementally decrease in length from the center towards the periphery of the core along the winding axis. Spacing between adjacent center sections of the windings is greater than a spacing between adjacent end sections of the front winding portions along the core periphery. The end sections are increasingly bent at the core periphery as a function of cumulative differences in spacing between the center and end sections.

Abstract: In one embodiment of this invention, the apparatus for sputter deposition within an evacuated volume comprises a compact gridless ion source into which an ionizable gas is introduced and from which ions leave with directed energies at or near the sputtering threshold and a sputter target near that source, biased negative relative to the surrounding vacuum enclosure, and located within the beam of ions leaving that source. Particles sputtered from the target are deposited on a deposition substrate spaced from both the ion source and the sputter target. An energetic beam of electrons can be generated by the incident ions striking the negatively biased sputter target and the deposition substrate is located either within or outside of this beam, depending on whether the net effect of bombardment by energetic electrons is beneficial or detrimental to that particular deposition process.

Abstract: A process for depositing amorphous or nanophase diamondlike carbon (DLC) and a-C:H carbon/hydrogen films with variable and controllable properties on the surface of a substrate is disclosed. The process utilizes a combined hydrocarbon ion beam and plasma-activated hydrocarbon gaseous radical flux produced by an end-Hall ion source to yield a film with good electron-emissivity characteristics or high hardness and good optical transparency, as desired. A second ion source providing a beam of argon ions above or together in nitrogen is optionally directed at the substrate for cleaning prior to deposition and for ion-assisted deposition during deposition or for doping.

Abstract: A transmission system which provides a tracked vehicle with a maximum rate of turn that decreases as higher forward gear-ratios are selected and, consequently, high low-speed manoeuvrability combined with relatively low, and therefore safe, maximum rates of turn at high vehicle speeds. This is achieved by means of a modifying differential arranged to rotate a steering input member of a steering differential at a rate equal to a multiple of the rotational speed of a power input member less a multiple of the rotational speed of the output member of a gear unit.