Abstract: An adaptor configured for mounting to a nose stem of a fastener gun, with the adaptor including a flexible elongate body portion that is stretchable over the nose stem of the fastener gun to retain the body portion thereon, and including an end affixed to the body portion, where the end is configured to engage with a mountable building fixture to secure the mountable building fixture to a building surface via a fastener discharged from the fastener gun. The mountable building fixtures may be plastic washers, metallic washers, as well as various plates or hangers, such as joist hangers or truss plates or other such connectors.

Abstract: A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber. The method further includes subjecting the substrate to a flow of the cleaning gas and the carbon source for a predetermined period of time to form the graphene.

Abstract: A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber. The method further includes subjecting the substrate to a flow of the cleaning gas and the carbon source for a predetermined period of time to form the graphene.

Abstract: A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber. The method further includes subjecting the substrate to a flow of the cleaning gas and the carbon source for a predetermined period of time to form the graphene.

Abstract: A method for forming graphene includes providing a substrate, subjecting the substrate to a reduced pressure environment, and providing a carrier gas and a carbon source. The method also includes exposing at least a portion of the substrate to the carrier gas, the carbon source, and at least one atmospheric gas and performing a CMOS compatible etching process on the at least a portion of the substrate. The method further includes performing, concurrently with the performing the CMOS compatible etching process, a CMOS compatible graphene growth process to convert a portion of the carbon source to graphene on the at least a portion of the substrate.

Abstract: A method of identifying a sample includes placing the sample in proximity to a plurality of nanoparticles and irradiating the plurality of nanoparticles with laser radiation. A plasmon resonance process results in heating of the plurality of nanoparticles due to the laser irradiation. The method also includes transferring energy from the plurality of nanoparticles to the sample, obtaining a Raman spectrum associated with sample, and identifying the sample based on the Raman spectrum.

Abstract: A system for graphene production includes a plurality of gas sources, a plurality of mass flow controllers, and a processing chamber. The system also includes a plasma source operable, a vacuum pump, a processor, and a non-transitory computer-readable storage medium including a plurality of computer-readable instructions. The plurality of instructions include instructions that cause the data processor to subject a substrate to a reduced pressure environment, to provide a carrier gas and a carbon source, and to expose at least a portion of the substrate to the carrier gas and the carbon source. The plurality of instructions also include instructions that cause the data processor to perform a surface treatment process on the at least a portion of the substrate and to convert a portion of the carbon source to graphene disposed on the at least a portion of the substrate.

Abstract: A method for forming graphene includes providing a substrate and subjecting the substrate to a reduced pressure environment. The method also includes providing a carrier gas and a carbon source and exposing at least a portion of the substrate to the carrier gas and the carbon source. The method further includes performing a surface treatment process on the at least a portion of the substrate and converting a portion of the carbon source to graphene disposed on the at least a portion of the substrate.

Abstract: A method of identifying a sample includes placing the sample in proximity to a plurality of nanoparticles and irradiating the plurality of nanoparticles with laser radiation. A plasmon resonance process results in heating of the plurality of nanoparticles due to the laser irradiation. The method also includes transferring energy from the plurality of nanoparticles to the sample, obtaining a Raman spectrum associated with sample, and identifying the sample based on the Raman spectrum.

Abstract: A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber. The method further includes subjecting the substrate to a flow of the cleaning gas and the carbon source for a predetermined period of time to form the graphene.

Abstract: A method for forming graphene includes providing a substrate and subjecting the substrate to a reduced pressure environment. The method also includes providing a carrier gas and a carbon source and exposing at least a portion of the substrate to the carrier gas and the carbon source. The method further includes performing a surface treatment process on the at least a portion of the substrate and converting a portion of the carbon source to graphene disposed on the at least a portion of the substrate.

Abstract: A method for making mononitrobenzene using a plug flow reactor train. Benzene, nitric acid and sulfuric acid are introduced into the reactor and produced mononitrobenzene is removed at an outlet end. All of the benzene and at least part of the sulfuric acid are introduced at the inlet end of the reactor. A first portion of the nitric acid is introduced by a first nitric acid feed into the inlet end and a second portion of the nitric acid is introduced at one or more additional feeds that are spaced between the inlet end and the outlet end. The method results in reduced formation of by-product dinitrobenzene, improving the reaction yield of mononitrobenzene while avoiding the need for a distillation step.

Abstract: A method of producing hydrogen includes providing a substrate having a plurality of nanoparticles disposed thereon and providing a source of electromagnetic radiation. The method also includes immersing the plurality of nanoparticles in an aqueous solution and irradiating at least a portion of the substrate having the plurality of nanoparticles disposed thereon with electromagnetic radiation. The method further includes exciting a plasmon resonance in the plurality of nanoparticles and converting a portion of the aqueous solution to hydrogen.

Abstract: A method for making mononitrobenzene using a plug flow reactor train. Benzene, nitric acid and sulfuric acid are introduced into the reactor and produced mononitrobenzene is removed at an outlet end. All of the benzene and at least part of the sulfuric acid are introduced at the inlet end of the reactor. A first portion of the nitric acid is introduced by a first nitric acid feed into the inlet end and a second portion of the nitric acid is introduced at one or more additional feeds that are spaced between the inlet end and the outlet end. The method results in reduced formation of by-product dinitrobenzene, improving the reaction yield of mononitrobenzene while avoiding the need for a distillation step.

Abstract: The present disclosure relates to methods and systems that provide heat, via at least Photon-Electron resonance, also known as excitation, of at least a particle utilized, at least in part, to initiate and/or drive at least one catalytic chemical reaction. In some implementations, the particles are structures or metallic structures, such as nanostructures. The one or more metallic structures are heated at least as a result of interaction of incident electromagnetic radiation, having particular frequencies and/or frequency ranges, with delocalized surface electrons of the one or more particles. This provides a control of catalytic chemical reactions, via spatial and temporal control of generated heat, on the scale of nanometers as well as a method by which catalytic chemical reaction temperatures are provided.

Abstract: A method of microfluidic control via localized heating includes providing a microchannel structure with a base region that is partially filled with a volume of liquid being separated from a gas by a liquid-gas interface region. The base region includes one or more physical structures. The method further includes supplying energy input to a portion of the one or more physical structures within the volume of liquid in a vicinity of the liquid-gas interface region to cause localized heating of the portion of the one or more physical structures. The method also includes transferring heat from the portion of the one or more physical structures to surrounding liquid in the vicinity of the liquid-gas interface region and generating an interphase mass transport at the liquid-gas interface region or across a gas bubble while the volume of liquid and the gas remain to be substantially at ambient temperature.

Abstract: Electrical oscillations are supplied to electrodes of a diathermal heating chamber. A liquid is passed through the diathermal heating chamber so as to be heated. The liquid has a minimum level of dissolved solids, which is replenished over time or when the dissolved solids in the liquid fall below a predetermined minimum level. Alternatively, when the level of dissolved solids is excessive, current input or liquid temperature is reduced.

Abstract: A method for generating heat includes passing a liquid between electrodes connected to an alternating current power supply. The liquid must have a sufficient level of electrolytes or dissolved minerals so as to be effectively heated. The level of current applied to the electrodes is preferably monitored and controlled. Exothermic, electrochemical reactions occur within the liquid and at the surface of the electrodes. More particularly, the electrodes are comprised of a material that can be oxidized, and the oxidation process during operation of the heater supplies additional current to heat the liquid.

Abstract: A method for forming a film of material using chemical vapor deposition. The method includes providing a substrate comprising a pattern of at least one metallic nanostructure, which is made of a selected material. The method includes determining a plasmon resonant frequency of the selected material of the nanostructure and exciting a portion of the selected material using an electromagnetic source having a predetermined frequency at the plasmon resonant frequency to cause an increase in thermal energy of the selected material. The method includes applying one or more chemical precursors overlying the substrate including the selected material excited at the plasmon resonant frequency and causing selective deposition of a film overlying at least the portion of the selected material.

Abstract: A method of microfluidic control via localized heating includes providing a microchannel structure with a base region that is partially filled with a volume of liquid being separated from a gas by a liquid-gas interface region. The base region includes one or more physical structures. The method further includes supplying energy input to a portion of the one or more physical structures within the volume of liquid in a vicinity of the liquid-gas interface region to cause localized heating of the portion of the one or more physical structures. The method also includes transferring heat from the portion of the one or more physical structures to surrounding liquid in the vicinity of the liquid-gas interface region and generating an interphase mass transport at the liquid-gas interface region or across a gas bubble while the volume of liquid and the gas remain to be substantially at ambient temperature.