Abstract: A magnetic gas gate adapted to operatively connect two adjacent dedicated chambers, in the first chamber of which a first layer is deposited upon a magnetic web of substrate material and in the second chamber of which a second layer is deposited onto the first layer. The first chamber has introduced thereinto gas constituents used to form the first layer while the second chamber (1) has introduced thereinto gas constituents used to form the second layer which constituents include at least one gas not introduced into the first chamber; and (2) is operatively associated with a mechanism for unidirectionally drawing the gases from the first chamber side of the gas gate toward the second chamber side of the gas gate. It is important that the second chamber gas constituents be substantially prevented from backflowing or diffusing through the gas gate to contaminate the gas constituents in the first chamber.

Abstract: An improved magnetic gas gate is adapted to operatively interconnect two adjacent chambers, in the first chamber of which process gases are introduced for depositing a first layer upon a magnetic substrate and in the second chamber of which process gases are introduced for depositing a second layer atop the first layer. Since it is important to prevent the second chamber gases from contaminating the first chamber gases, a constant pressure differential established between the chambers is employed to provide a substantially unidirectional flow of gases from the first chamber into the second chamber. Magnetic gas gates have been used in the prior art to reduce the size of gas gate passageways by creating a magnetic field which urges the unlayered surface of the substrate toward a wall of the passageway.

Abstract: A grooved passageway surface in a magnetic gas gate, the gas gate adapted to operatively connect two adjacent chambers, in the first chamber of which process gases are introduced for depositing a first layer upon a magnetic substrate and in the second chamber of which process gases are introduced for depositing a second layer atop the first layer. Since it is important to prevent the second chamber gases from contaminating the first chamber gases, a constant pressure differential established between the chambers is employed to provide a substantially unidirectional flow of gases from the first chamber into the second chamber. Magnetic gas gates have been used in the prior art to reduce the size of gas gate passageways by creating a magnetic field which urges the unlayered surface of the substrate toward a wall of the passageway.

Abstract: An improved glow discharge deposition apparatus for depositing amorphous layers upon at least one substrate, the apparatus including a housing capable of withstanding vacuum pressures, a substrate upon which the amorphous layers are deposited, an r.f. powered cathode adapted to cooperate with the substrate for producing a plasma region in the housing, layer-producing materials adapted to be introduced into the plasma region, and heating elements for warming the substrate to a deposition-effecting temperature. The improvement is provided by an electrically insulated base adapted to support the cathode in a non-horizontal, preferably a vertical, plane and a prop adapted to support the substrate in a plane adjacent and parallel to the non-horizontal plane in which the cathode is supported.

Abstract: A cathode for use in a glow discharge chamber. A top surface electrode is adapted to provide a substantially uniform distribution of reaction gases at the active surface of an overlying substrate as it advances through the chamber. A plurality of baffles within the cathode creates equal path lengths for reaction gases from their source to the surface electrode and from the surface electrode to a vacuum. The electrode is electrically insulated from a plurality of gas exits so that the generation of plasma is confined solely to a region between the electrode and the active surface of the substrate.