Patents by Inventor David A. Valeri

David A. Valeri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coating compositions suitable for use with an overcoated photoresist
    Patent number: 10539873
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: January 21, 2020
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri
  • Coating compositions suitable for use with an overcoated photoresist
    Patent number: 9726977
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
    Type: Grant
    Filed: February 8, 2010
    Date of Patent: August 8, 2017
    Assignee: GlobalFoundries Inc.
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri, Libor Vyklicky, Wu-Song S. Huang, Wenjie Li, Pushkara R. Varanasi, Irene Y. Popova
  • COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20170108776
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: January 26, 2015
    Publication date: April 20, 2017
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri
  • Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
    Patent number: 9606434
    Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z? are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: March 28, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS, LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Photoresist composition and associated method of forming an electronic device
    Patent number: 9557642
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: January 31, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • Photoresist composition and associated method of forming an electronic device
    Patent number: 9551930
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: January 24, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
    Patent number: 9527936
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: December 27, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
    Patent number: 9469705
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: October 18, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Photoresist composition and associated method of forming an electronic device
    Patent number: 9470976
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: October 18, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD
    Publication number: 20160102157
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE
    Publication number: 20160103392
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE
    Publication number: 20160103391
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD
    Publication number: 20160102158
    Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z? are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Application
    Filed: August 24, 2015
    Publication date: April 14, 2016
    Inventors: Paul J. LaBeaume, Vipul Jain, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Coating compositions suitable for use with an overcoated photoresist
    Patent number: 8940472
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: February 8, 2010
    Date of Patent: January 27, 2015
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri
  • Coating compositions suitable for use with an overcoated photoresist
    Publication number: 20100297557
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
    Type: Application
    Filed: February 8, 2010
    Publication date: November 25, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri, Libor Vyklicky, Wu-Song S. Huang, Wenjie Li, Pushkara R. Varanasi, Irene Y. Popova
  • Coating compositions suitable for use with an overcoated photoresist
    Publication number: 20100297556
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: February 8, 2010
    Publication date: November 25, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Jin Wuk Sung, John P. Amara, Gregory P. Prokopowicz, David A. Valeri
  • Electrode, electrochemical cell, and method for analysis of electroplating baths
    Patent number: 7144488
    Abstract: A counter electrode for use in an electrochemical cell suitable for analysis of an electroplating composition, the counter electrode comprising a conductor; a sheath disposed about the conductor; an electrolyte disposed within the sheath; and an optionally porous element on the sheath, the porous element providing signal communication between the electrolyte and an analyte.
    Type: Grant
    Filed: June 5, 2003
    Date of Patent: December 5, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Robert A. Binstead, Osnat Younes-Metzler, David A. Valeri, Robert D. Mikkola
  • Electrode, electrochemical cell, and method for analysis of electroplating baths
    Publication number: 20040089538
    Abstract: A counter electrode for use in an electrochemical cell suitable for analysis of an electroplating composition, the counter electrode comprising a conductor; a sheath disposed about the conductor; an electrolyte disposed within the sheath; and an optionally porous element on the sheath, the porous element providing signal communication between the electrolyte and an analyte.
    Type: Application
    Filed: June 5, 2003
    Publication date: May 13, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert A. Binstead, Osnat Younes-Metzler, David A. Valeri, Robert D. Mikkola