Abstract: A present invention and method provides a pressure injection apparatus (20) that injects a quantitatively defined volume of liquid sample (21) from a container (22) into a capillary device (23). A servo pressure primary regulator (26) is included which precisely regulates the fluid from a supply pressure (P.sub.S) to a substantially constant regulated pressure (P.sub.R) in communication with the liquid sample (21) for a predetermined period of time. A feedback mechanism cooperates with a valving assembly (31) to continuously monitor and adjust the regulated pressure (P.sub.R) to be substantially constant and precise for delivery to the container (21).

Abstract: Flowrate in a precision pump used for liquid chromatography employs a digital control system incorporating artificial intelligence. The pump system operates in a default flow mode, wherein real-time pressure feedback is not used to control motor speed, or in pressure mode, wherein motor speed is controlled by the pump system pressure point. The artificial intelligence commands mode changes to pressure mode when the constant displacement flow measurement time is within a threshold relative to commanded flowrate, and when the higher pressure piston is being measured. Flow mode pressure ripple is minimized by monitoring pressure points and commanding motor speed change at appropriate positions during the motor cam rotation. Pressure mode uses the higher pressurized piston as a reference for constant displacement flow measurement and provides accurate flowrate even if one piston is leaky.

Abstract: A method and apparatus for predicting the number of contaminant particles in circuit area of a patterned semiconductor wafer having a number of reflective circuit areas. The method includes forming on a wafer in specified areas, a grating test pattern, such as a line grating. The grating patterns are formed at the same time and in the same manner that repetitive circuit patterns are formed on the wafer. The wafer is then scanned by a light beam. Since the diffraction pattern caused by the grating test patterns is known, it is possible to detect when the light beam is scanning one of the known grating patterns. The diffraction pattern may be inspected for fabrication derived variations. In response to detecting a known grating pattern, a detection mechanism is activated. Since the diffraction pattern is known it may be spatially separated. In this way only light scattered by particles or defects in the pattern are collected and detected.

Abstract: Methods for determining the presence or absence of, and the thickness or other spacial extent of, a contaminant layer at each of a plurality of two or more sites on the surface of an electrically conductive material such as a semiconductor, a metal or a metal silicide. The invention uses a change in photoemission current from an illuminated spot on the surface to determine the presence and extent of a contaminant layer at the illuminated site. Compensation is provided for the effects of capacitive current and photovoltaic current. The invention provides a pattern of illumination sites on the conductor surface that can, if desired, cover all points on the surface.

Abstract: Method and apparatus for determining the amount, if any, of residue remaining at the bottom of an aperture in a layer of dielectric or insulator material. A layer of electrically conducting material is positioned adjacent to the aperture bottom, an electron collector is positioned adjacent to the mouth of the aperture, and a voltage difference (optional) is impressed between the conducting material and the electron collector. The aperture bottom is illuminated with a light beam with photon energy greater than the electron work function of the conducting material, and a portion of the photons that comprise the light beam reach the conducting material and produce photoelectrons by photoemissive action. A photoelectron current is sensed by the electron collector, and the cleanliness of the aperture bottom is determined from the value of the current.

Abstract: A controller for a load such as the heater elements of an actuator for drying the various zones or slices of a moving sheet of a papermaking machine includes silicon controlled rectifiers for each zone or slice of the moving sheet whose firing angle is controlled by an external power command signal. This power command signal is processed by a digital signal processor which strobes at a high rate the line voltage and load current to provide a closed loop feedback control technique for power being applied to the load and in addition, the processor, at the same time, has an open loop firing angle control routine which has a fast response time to protect against abnormal conditions within one-half cycle of load voltage.

Abstract: An improved high power (40,000 watt) high intensity arc discharge power supply which provides reliable, automatic ignition control and enables precise variation of lamp power in dual AC and DC modes of operation over an extended dynamic range from 400 watts to 40,000 watts. A capacitive boost circuit is provided to supply the high voltage necessary to ignite the lamp. Upon start-up, the voltage on a boost circuit capacitor is monitored by an ignition circuit which automatically enables the ignitor when the voltage is at the required level and switches the ignitor off when the lamp starts. After ignition the boost charging circuit is disabled and the power supply operates in a normal mode. The power supply operates on a three phase alternating voltage input through a three phase bridge, switches it through a drive transistor and then supplies it to an inductor. The signal is then supplied through an H-bridge commutator to the boost circuit, the ignitor and the arc lamp itself.