Patents by Inventor David Allen UNRUH, JR.

David Allen UNRUH, JR. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11127682
    Abstract: Semiconductor packages having nonspherical filler particles are described. In an embodiment, a semiconductor package includes a package substrate having a dielectric layer over an electrical interconnect. The dielectric layer includes nonspherical filler particles in a resin matrix. The nonspherical filler particles have an aspect ratio greater than one.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: September 21, 2021
    Assignee: Intel Corporation
    Inventors: Sashi S. Kandanur, David Allen Unruh, Jr., Srinivas V. Pietambaram
  • Publication number: 20200135648
    Abstract: Semiconductor packages having nonspherical filler particles are described. In an embodiment, a semiconductor package includes a package substrate having a dielectric layer over an electrical interconnect. The dielectric layer includes nonspherical filler particles in a resin matrix. The nonspherical filler particles have an aspect ratio greater than one.
    Type: Application
    Filed: June 30, 2017
    Publication date: April 30, 2020
    Inventors: Sashi KANDANUR, David Allen UNRUH, JR., Srinivas V. PIETAMBARAM
  • Publication number: 20190279935
    Abstract: Semiconductor packages including package substrates having non-homogeneous dielectric layers, and methods of fabricating such semiconductor packages, are described. In an example, a semiconductor package substrate includes a dielectric layer having a resin-rich region, e.g., a resin-rich sublayer, and a filler-rich region, e.g., a filler-rich sublayer. The sublayers may contain respective mixtures of an organic resin material and an inorganic filler material. The filler-rich sublayer may have a higher density of the inorganic filler material than the resin-rich sublayer. A density of the inorganic filler material may be lesser near a top surface of 0 the dielectric layer in which an electrical interconnect is embedded. The electrical interconnect may have a greater adhesion affinity to the organic resin material than the inorganic filler material, and thus, the electrical interconnect may readily attach to the functionally-graded dielectric layer.
    Type: Application
    Filed: December 29, 2016
    Publication date: September 12, 2019
    Inventors: David Allen UNRUH, JR., Srinivas V. PIETAMBARAM, Rahul N. MANEPALLI