Patents by Inventor David Atchley

David Atchley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DEPOSITION CHAMBER SYSTEM DIFFUSER WITH INCREASED POWER EFFICIENCY
    Publication number: 20230122134
    Abstract: A diffuser includes a front-side gradient surface formed from a diffuser block, a back-side gradient surface formed from the diffuser block, and opening structures formed from the front-side gradient surface to the back-side gradient surface. Each opening structure includes a conical opening having a first end along the front-side gradient surface and a second end corresponding to an apex at a depth within the diffuser block, and a cylindrical opening formed from the depth to the back-side gradient surface. The opening structures are arranged in rows including a first set of rows and a second set of rows alternately positioned along a length of the diffuser block.
    Type: Application
    Filed: October 19, 2021
    Publication date: April 20, 2023
    Inventors: Changling Li, Lai Zhao, Gaku Furuta, Soo Young Choi, Robin L. Tiner, David Atchley, Ganesh Babu Chandrasekaran
  • Susceptor with roll-formed surface and method for making same
    Patent number: 9243328
    Abstract: The present invention generally provides apparatus for supporting a large area substrate in a plasma reactor. One embodiment, a substrate support for using in a plasma reactor includes an electrically conductive body has a top surface with a plurality of roll-formed indents.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: January 26, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Gaku Furuta, David Atchley, Soo Young Choi, John M. White
  • SUSCEPTOR WITH ROLL-FORMED SURFACE AND METHOD FOR MAKING SAME
    Publication number: 20090238734
    Abstract: The present invention generally provides apparatus for supporting a large area substrate in a plasma reactor. One embodiment, a substrate support for using in a plasma reactor includes an electrically conductive body has a top surface with a plurality of roll-formed indents.
    Type: Application
    Filed: March 19, 2009
    Publication date: September 24, 2009
    Applicant: Applied Materials, Inc.
    Inventors: Gaku Furuta, David Atchley, Soo Young Choi, John M. White