Patents by Inventor David B. Pollock

David B. Pollock has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9628682
    Abstract: A camera concurrently produces an orthographic map and map spectral content. Illumination from an image passes through a phase modulator and the resulting rotating photo-flux phase is converted to an electrical signal by multiple adjacent sensors of detectors of array of detectors. The amount of unwanted illumination reaching the sensors is reduced by a set of baffles that shield and protect the transducers from unwanted out-of-field light and other light sources.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: April 18, 2017
    Assignee: Board of Trustees of the University of Alabama, fo
    Inventors: David B. Pollock, Patrick J. Reardon
  • Publication number: 20140300806
    Abstract: A camera concurrently produces an orthographic map and map spectral content. illumination from an image passes through a phase modulator and the resulting rotating photo-flux phase is converted to an electrical signal by multiple adjacent sensors of detectors of array of detectors. The amount of unwanted illumination reaching the sensors is reduced by a set of baffles that shield and protect the transducers from unwanted out-of-field light and other light sources.
    Type: Application
    Filed: July 13, 2012
    Publication date: October 9, 2014
    Inventors: David B. Pollock, Patrick J. Reardon
  • Patent number: 4685778
    Abstract: A process for nuclear hardening an optical part consisting of a prepared beryllium substrate processed to yield a surface finish of at least 125 micro-inch rms that is subsequently provided with a vapor deposited coating of beryllium of about 0.012 inch .+-.0.002 inch thick. The vapor deposited coating is precision finished to a low-scatter, first surface mirror on a beryllium substrate.The disclosed process broadly comprises:1. selecting a suitable substrate material of high purity beryllium;2. matching to shape;3. processing and annealing the machined part;4. mild alkaline cleaning the machined part;5. etching the machined part;6. precision machining holes, threads, and lap precision surfaces;7. cleaning all surfaces by vapor degreasing;8. coating surfaces by vapor depositing beryllium;9. thermally processing by immersing coated part in liquid nitrogen; and10. grinding, polishing, and configuring to yield a low-scatter first surface mirror on a beryllium substrate.
    Type: Grant
    Filed: May 12, 1986
    Date of Patent: August 11, 1987
    Inventor: David B. Pollock