Patents by Inventor David B. Powell
David B. Powell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7803510Abstract: A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured features in the coated film on the substrate to prevent stress failures in subsequent metallization of the substrate due to steep angles of the imaged features, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (c) at least one photoactive compound is also present in the composition.Type: GrantFiled: August 7, 2006Date of Patent: September 28, 2010Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, David B. Powell, Donald W. Racicot, Il'ya Rushkin, William D. Weber
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Publication number: 20090004444Abstract: A positive-working photosensitive composition containing one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate.Type: ApplicationFiled: August 21, 2008Publication date: January 1, 2009Applicant: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, Richard Hopla, David B. Powell, Jon Metivier, Il'ya Rushkin
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Publication number: 20080305431Abstract: A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2??VI in which each of Y, V1, and V2 is defined in the specification; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; in which the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.Type: ApplicationFiled: June 10, 2008Publication date: December 11, 2008Inventors: David B. Powell, Ahmad A. Naiini, N. Jon Metivier, II'ya Rushkin, Richard Hopla
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Patent number: 7416830Abstract: A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.Type: GrantFiled: February 18, 2005Date of Patent: August 26, 2008Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, Richard Hopla, David B. Powell, Jon Metivier, Il'ya Rushkin
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Patent number: 7407731Abstract: A photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer; (b) at least one compound having Structure VI ?wherein, V is CH or N, Y is O or NR3 wherein R3 is H, CH3 or C2H5, R1 and R2 each independently are H, C1-C4 alkyl group, C1-C4 alkoxy group, cyclopentyl or cyclohexyl, or alternatively, R1 and R2 can be fused to produce a substituted or unsubstituted benzene ring; and (c) at least one solvent; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the composition is coated on a substrate and the coated substrate is subsequently processed to form an image on the substrate, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety in the polymer, then (d) at least one photoactive compound is also present in the composition.Type: GrantFiled: March 22, 2006Date of Patent: August 5, 2008Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, David B. Powell, N. Jon Metivier, Donald F. Perry
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Patent number: 7399572Abstract: A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y? n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.Type: GrantFiled: June 2, 2006Date of Patent: July 15, 2008Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: David B. Powell, Ahmad A. Naiini, N. Jon Metivier, Il'ya Rushkin, Richard Hopla
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Patent number: 7220520Abstract: A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI V1—Y—V2 VI wherein Y is selected from S, O, NR2, (HOCH)p, and each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1–C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursorType: GrantFiled: June 2, 2006Date of Patent: May 22, 2007Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, David B. Powell, N. Jon Metivier, Il'ya Rushkin, Richard Hopla
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Patent number: 7129011Abstract: A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): ?wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar2 is a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, or a divalent aliphatic group that may contain silicon; Ar3 is a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar4 is Ar1 (OH)2 or Ar2; G is a monovalent organic group a carbonyl, carbonyloxy or sulfonyl group; (b) one or more photo-active compounds which release acid upon irradiation (PAGs); (c) one or more latent crosslinkers each of which contains at least two ˜N—(CH2OR)n units (n=1 or 2, wherein R is a linear or branched C1–C8 alkyl group); (d) at least one solvent, and (e) at least one dissolution rate modifier, withType: GrantFiled: June 3, 2004Date of Patent: October 31, 2006Assignee: Arch Specialty Chemicals, Inc.Inventors: Ilya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber, David B. Powell
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Publication number: 20040253537Abstract: A heat resistant negative working photosensitive composition that comprisesType: ApplicationFiled: June 3, 2004Publication date: December 16, 2004Applicant: Arch Specialty Chemicals, Inc.Inventors: IIya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber, David B. Powell
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Patent number: 4499344Abstract: An interlock arrangement is provided between adjoining circuit breaker compartments by the addition of a contact arm operated interlock to circuit breakers which contain trip arm operated interlocks. The contact arm interlock comprises a paddle mounted on the rear surface of each of the adjoining breakers for sensing the condition of the contacts in one breaker and for interreacting with the trip arm interlock mechanism to trip the breaker when an attempt is made to close the first breaker contacts while the adjoining breaker contacts are closed. A stop lever mounted in the first breaker compartment interconnects with a similar lever mounted in the compartment of the adjoining breaker to prevent the first breaker contacts from being closed while the adjoining breaker contacts are closed. The compartment interlock arrangement finds utility when one of the interconnected circuit breakers connects with a utility power source and the other circuit breaker connects with an auxiliary generator.Type: GrantFiled: April 11, 1983Date of Patent: February 12, 1985Assignee: General Electric CompanyInventors: Roger N. Castonguay, David B. Powell
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Patent number: 4489362Abstract: A switchgear unit contains interlocked circuit breaker and fuse compartments. The interlock prevents the fuses from being withdrawn from their power stabs until the circuit breaker is withdrawn from its power stabs first. A mechanical linkage arrangement causes an interference between the racking tool and the fuse compartment racking shaft until the breaker is withdrawn from the breaker compartment power stabs.Type: GrantFiled: March 1, 1983Date of Patent: December 18, 1984Assignee: General Electric CompanyInventors: Roger N. Castonguay, Jon P. McCuin, David B. Powell
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Patent number: 4220936Abstract: A manually operated mechanism of an industrial circuit breaker utilizes a hook to hold the movable contacts open against the bias of charged mechanism springs. Manual or closing solenoid initiated articulation of the hook releases the contacts for abrupt closure under the urgence of the discharging mechanism springs. An indicator appropriately positioned by the operating mechanism identifies the charged and discharged mechanism states.Type: GrantFiled: April 6, 1979Date of Patent: September 2, 1980Assignee: General Electric CompanyInventor: David B. Powell
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Patent number: 4042896Abstract: A circuit breaker is equipped with both a rotary operating handle and a power unit for selective manual and motor driven operation thereof. Mechanical and electrical control elements cooperate to insure a reliable operation in both the manual and motor driven operating modes, and, as a safety measure, to provide fool-proof, visual indications of the circuit breaker condition during the progressive stages of either operating mode. The power unit utilizes a permanent magnet, DC motor for improved performance and economies in design.Type: GrantFiled: April 1, 1976Date of Patent: August 16, 1977Assignee: General Electric CompanyInventors: David B. Powell, Roger N. Castonguay, Donald F. Aitken
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Patent number: 4001739Abstract: A circuit breaker includes an operating mechanism having powerful mechanism springs to achieve the requisite contact pressure for high current carrying capacity. A rotary handle resets the operating mechanism via a reciprocating slide and latching mechanism, while loading the mechanism springs. Return of the handle to its original position achieves rapid closure of the circuit breaker contacts. The circuit breaker is equipped with a trip solenoid and an accessory which includes a bell alarm switch and a breaker lockout operating automatically in response to tripping of the circuit breaker by the trip solenoid.Type: GrantFiled: October 30, 1975Date of Patent: January 4, 1977Assignee: General Electric CompanyInventors: David B. Powell, Vincent P. Acampora