Patents by Inventor David Bessems

David Bessems has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100103391
    Abstract: A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.
    Type: Application
    Filed: October 21, 2009
    Publication date: April 29, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Danny Maria Hubertus PHILIPS, Koen STEFFENS, Tijmen Wilfred Mathijs GUNTHER, David BESSEMS
  • Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
    Publication number: 20090201485
    Abstract: A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
    Type: Application
    Filed: November 6, 2008
    Publication date: August 13, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Theodoor Wilhelmus Van Der Heijden, Marco Koert Stavenga, Patrick Wong, Frederik Johannes Van Den Bogaard, Dirk De Vries, David Bessems, Jacques Roger Alice Mycke