Patents by Inventor David Brzozowy

David Brzozowy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions
    Patent number: 6911297
    Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise: a) a first photoacid generator compound which comprises one or more compounds of the structure (A); b) a second photoacid generator compound which comprises one or more compounds of the structure (B); c) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat; wherein said polymer comprises one or more polymers comprising the monomer unit (C); ?and d) a solvent.
    Type: Grant
    Filed: June 19, 2003
    Date of Patent: June 28, 2005
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: David Brzozowy, J. Thomas Kocab, John P. Hatfield, Lawerence Ferreira, Andrew Blakeney
  • Photoresist compositions
    Publication number: 20040072095
    Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:
    Type: Application
    Filed: June 19, 2003
    Publication date: April 15, 2004
    Applicant: Arch Speciality Chemical, Inc.
    Inventors: David Brzozowy, Kocab J. Thomas, John P. Hatfield, Lawrence Ferreira, Andrew Blakeney
  • Novel beta-oxo compounds and their use in photoresist
    Publication number: 20030078354
    Abstract: Polymers comprising monomeric units of acid sensitive (acid labile) monomers and from about 2 to about 20% by weight of monomeric units of &bgr;-oxo ester containing monomers, wherein the &bgr;-oxo ester containing monomers are free of lactams or lactones, are useful as binder resins in radiation sensitive photoresist compositions for producing a resist image on a substrate.
    Type: Application
    Filed: February 21, 2002
    Publication date: April 24, 2003
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Art Medina, Ilya Rushkin, Gregory Spaziano, David Brzozowy
  • Free-acid containing polymers and their use in photoresists
    Publication number: 20030064321
    Abstract: An improved binder resist for use in radiation sensitve photoresist compositions comprises a polymer having monomeric units of (a) carboxylic anhydride units, (b) alkenyl silane units and (c) units containing an acid labile group, and wherein the polymer contains from about 1 to about 3 mol % of free acid wherein the free acid is provided either by the presence in the polymer of a futher monomeric unit having free acids groups or by hydrolysis of sufficient of the carboxylic anhydride monomeric unit.
    Type: Application
    Filed: August 28, 2002
    Publication date: April 3, 2003
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Sanjay Malik, Ilya Rushkin, Gregory Spaziano, David Brzozowy, Art Medina
  • Photoresist developer containing fluorinated amphoteric surfactant
    Patent number: 5164286
    Abstract: Described herein is a developer for alkali developable photoresists which comprises the addition of a selected fluorinated amphoteric surfactant to an aqueous basic solution.
    Type: Grant
    Filed: January 24, 1992
    Date of Patent: November 17, 1992
    Assignee: OCG Microelectronic Materials, Inc.
    Inventors: Andrew J. Blakeney, Robert Rogler, Medhat Toukhy, David Brzozowy