Patents by Inventor David C. Brandt
David C. Brandt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10635002Abstract: A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.Type: GrantFiled: December 9, 2016Date of Patent: April 28, 2020Assignee: ASML NETHERLANDS B.V.Inventors: David C. Brandt, Alexander I. Ershov, Igor V. Fomenkov
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Patent number: 9713239Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.Type: GrantFiled: December 7, 2010Date of Patent: July 18, 2017Assignee: ASML Netherlands B.V.Inventors: Bjorn A. M. Hansson, Alexander N. Bykanov, Igor V. Fomenkov, David C. Brandt
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Publication number: 20170097572Abstract: A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.Type: ApplicationFiled: December 9, 2016Publication date: April 6, 2017Inventors: David C. Brandt, Alexander I. Ershov, Igor V. Fomenkov
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Patent number: 9541840Abstract: A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.Type: GrantFiled: December 18, 2014Date of Patent: January 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: David C. Brandt, Alexander I. Ershov, Igor V. Fomenkov
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Publication number: 20160179012Abstract: A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.Type: ApplicationFiled: December 18, 2014Publication date: June 23, 2016Applicant: ASML Netherlands B.V.Inventors: David C. BRANDT, Alexander I. ERSHOV, Igor V. FOMENKOV
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Publication number: 20120193547Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.Type: ApplicationFiled: April 6, 2012Publication date: August 2, 2012Inventors: Bjorn A. M. Hansson, Alexander N. Bykanov, Igor V. Fomenkov, David C. Brandt
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Patent number: 8198615Abstract: Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.Type: GrantFiled: February 2, 2010Date of Patent: June 12, 2012Assignee: Cymer, Inc.Inventors: Alexander N. Bykanov, Alexander I. Ershov, Igor V. Fomenkov, David C. Brandt
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Publication number: 20110079736Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.Type: ApplicationFiled: December 7, 2010Publication date: April 7, 2011Applicant: Cymer, Inc.Inventors: Bjorn A. M. Hansson, Alexander N. Bykanov, Igor V. Fomenkov, David C. Brandt
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Patent number: 7872245Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.Type: GrantFiled: June 19, 2008Date of Patent: January 18, 2011Assignee: Cymer, Inc.Inventors: Georgiy O. Vaschenko, Alexander N. Bykanov, Norbert R. Bowering, David C. Brandt, Alexander I. Ershov, Rodney D. Simmons, Oleh V. Khodykin, Igor V. Fomenkov
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System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
Patent number: 7812329Abstract: A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.Type: GrantFiled: December 14, 2007Date of Patent: October 12, 2010Assignee: Cymer, Inc.Inventors: Alexander N. Bykanov, David C. Brandt, Igor V. Fomenkov, William N. Partlo -
Publication number: 20100140514Abstract: Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.Type: ApplicationFiled: February 2, 2010Publication date: June 10, 2010Applicant: Cymer, Inc.Inventors: Alexander N. Bykanov, Alexander I. Ershov, Igor V. Fomenkov, David C. Brandt
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Publication number: 20100127186Abstract: A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.Type: ApplicationFiled: January 11, 2010Publication date: May 27, 2010Applicant: Cymer, Inc.Inventors: Alexander N. Bykanov, Norbert Bowering, Igor V. Fomenkov, David C. Brandt, Alexander I. Ershov, Oleh Khodykin, William N. Partlo
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Patent number: 7671349Abstract: A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.Type: GrantFiled: April 10, 2007Date of Patent: March 2, 2010Assignee: Cymer, Inc.Inventors: Alexander N. Bykanov, Norbert Bowering, Igor V. Fomenkov, David C. Brandt, Alexander I. Ershov, Oleh Khodykin, William N. Partlo
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Patent number: 7655925Abstract: Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.Type: GrantFiled: August 31, 2007Date of Patent: February 2, 2010Assignee: Cymer, Inc.Inventors: Alexander N. Bykanov, Alexander I. Ershov, Igor V. Fomenkov, David C. Brandt
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Publication number: 20090230326Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.Type: ApplicationFiled: June 19, 2008Publication date: September 17, 2009Applicant: CYMER, INC.Inventors: Georgiy O. Vaschenko, Alexander N. Bykanov, Norbert R. Bowering, David C. Brandt, Alexander I. Ershov, Rodney D. Simmons, Oleh V. Khodykin, Igor V. Fomenkov
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System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
Publication number: 20090154642Abstract: A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.Type: ApplicationFiled: December 14, 2007Publication date: June 18, 2009Applicant: Cymer, Inc.Inventors: Alexander N. Bykanov, David C. Brandt, Igor V. Fomenkov, William N. Partlo -
Publication number: 20090057567Abstract: Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.Type: ApplicationFiled: August 31, 2007Publication date: March 5, 2009Applicant: Cymer, Inc.Inventors: Alexander N. Bykanov, Alexander I. Ershov, Igor V. Fomenkov, David C. Brandt
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Publication number: 20080149862Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.Type: ApplicationFiled: December 22, 2006Publication date: June 26, 2008Applicant: Cymer, Inc.Inventors: Bjorn A. M. Hansson, Alexander N. Bykanov, Igor V. Fomenkov, David C. Brandt