Patents by Inventor David C. Chapman
David C. Chapman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11949725Abstract: One embodiment provides for a media playback device comprising a memory device to store instructions; one or more processors to execute the instructions stored on the memory device, the instructions to cause the one or more processors to provide a playback queue manager to manage one or more media playback queues including a set of media items associated with a scheduled event and a playback routing manager to determine an output destination for the set of media items based on context associated with the scheduled event, the playback routing manager to route output of playback of the set of media items to one or more of multiple different connected media playback devices based on the context associated with the scheduled event.Type: GrantFiled: April 11, 2022Date of Patent: April 2, 2024Assignee: Apple Inc.Inventors: Thomas M. Alsina, David C. Graham, Andrew M. Wadycki, Edward T. Schmidt, Joel M. Lopes Da Silva, Richard M. Powell, Gregory R. Chapman
-
Patent number: 10636929Abstract: An avalanche photodiode detector is provided with a substrate including an array of avalanche photodiodes. An optical interface surface of the substrate is arranged for accepting external input radiation. There is provided at least one cross-talk blocking layer of material including apertures positioned to allow external input radiation to reach photodiodes and including material regions positioned for attenuating radiation in the substrate that is produced by photodiodes in the array. Alternatively at least one cross-talk blocking layer of material is disposed on the optical interface surface of the substrate to allow external input radiation to reach photodiodes and attenuate radiation in the substrate that is produced by photodiodes in the array. At least one cross-talk filter layer of material can be disposed in the substrate adjacent to the photodiode structures, including a material that absorbs radiation in the substrate that is produced by photodiodes in the array.Type: GrantFiled: April 30, 2010Date of Patent: April 28, 2020Assignee: Massachusetts Institute of TechnologyInventors: K. Alexander McIntosh, David C. Chapman, Joseph P. Donnelly, Douglas C. Oakley, Antonio Napoleone, Erik K. Duerr, Simon Verghese, Richard D. Younger
-
Patent number: 10361334Abstract: An avalanche photodiode detector is provided with a substrate including an array of avalanche photodiodes. An optical interface surface of the substrate is arranged for accepting external input radiation. There is provided at least one cross-talk blocking layer of material including apertures positioned to allow external input radiation to reach photodiodes and including material regions positioned for attenuating radiation in the substrate that is produced by photodiodes in the array. Alternatively at least one cross-talk blocking layer of material is disposed on the optical interface surface of the substrate to allow external input radiation to reach photodiodes and attenuate radiation in the substrate that is produced by photodiodes in the array. At least one cross-talk filter layer of material can be disposed in the substrate adjacent to the photodiode structures, including a material that absorbs radiation in the substrate that is produced by photodiodes in the array.Type: GrantFiled: December 31, 2014Date of Patent: July 23, 2019Assignee: Massachusetts Institute of TechnologyInventors: K. Alexander McIntosh, David C. Chapman, Joseph P. Donnelly, Douglas C. Oakley, Antonio Napoleone, Erik K. Duerr, Simon Verghese, Richard D. Younger
-
Publication number: 20160181458Abstract: An avalanche photodiode detector is provided with a substrate including an array of avalanche photodiodes. An optical interface surface of the substrate is arranged for accepting external input radiation. There is provided at least one cross-talk blocking layer of material including apertures positioned to allow external input radiation to reach photodiodes and including material regions positioned for attenuating radiation in the substrate that is produced by photodiodes in the array. Alternatively at least one cross-talk blocking layer of material is disposed on the optical interface surface of the substrate to allow external input radiation to reach photodiodes and attenuate radiation in the substrate that is produced by photodiodes in the array. At least one cross-talk filter layer of material can be disposed in the substrate adjacent to the photodiode structures, including a material that absorbs radiation in the substrate that is produced by photodiodes in the array.Type: ApplicationFiled: December 31, 2014Publication date: June 23, 2016Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGYInventors: K. Alexander McIntosh, David C. Chapman, Joseph P. Donnelly, Douglas C. Oakley, Antonio Napoleone, Erik K. Duerr, Simon Verghese, Richard D. Younger
-
Patent number: 8352890Abstract: An approach is provided for converting a polygon described as an ordered list of perimeter points into a set of connected quadrilaterals suitable for use in an advanced integrated circuit router. Edges are constructed between the points of the polygon. Then, one or more edges are selected as starting locations. Pairs of edges or portions of pairs of edges are matched to form sequences of quadrilaterals. Methods are provided to determine when edges should be split or skipped to ensure that all quadrilaterals are convex or meet other criteria. Other methods are provided to determine when the matching process should be terminated and restarted at another location. Finally, the sequences of quadrilaterals are joined together to form a data structure suitable for use within an integrated circuit router.Type: GrantFiled: February 9, 2010Date of Patent: January 8, 2013Inventor: David C. Chapman
-
Publication number: 20110215275Abstract: The use of surfactants that do not themselves act as dopants and are isoelectronic with either the group III or group V host atoms during OMVPE growth significantly reduces the incorporation of background impurities such as carbon, oxygen, sulfur and/or silicon. For example, the use of the surfactants Sb or Bi significantly reduces the incorporation of background impurities such as carbon, oxygen, sulfur and/or silicon during the OMVPE growth of III/V semiconductor materials, for example GaAs, GaInP, and GaP layers. As a result, an effective method for controlling the incorporation of impurity atoms is adding a minute amount of surfactant during OMVPE growth.Type: ApplicationFiled: December 5, 2007Publication date: September 8, 2011Applicant: The University of Utah Research FoundationInventors: Gerald B. Stringfellow, Alexander D. Howard, David C. Chapman
-
Publication number: 20110169117Abstract: An avalanche photodiode detector is provided with a substrate including an array of avalanche photodiodes. An optical interface surface of the substrate is arranged for accepting external input radiation. There is provided at least one cross-talk blocking layer of material including apertures positioned to allow external input radiation to reach photodiodes and including material regions positioned for attenuating radiation in the substrate that is produced by photodiodes in the array. Alternatively at least one cross-talk blocking layer of material is disposed on the optical interface surface of the substrate to allow external input radiation to reach photodiodes and attenuate radiation in the substrate that is produced by photodiodes in the array. At least one cross-talk filter layer of material can be disposed in the substrate adjacent to the photodiode structures, including a material that absorbs radiation in the substrate that is produced by photodiodes in the array.Type: ApplicationFiled: April 30, 2010Publication date: July 14, 2011Applicant: Massachusetts Institute of TechnologyInventors: K. Alexander McIntosh, David C. Chapman, Joseph P. Donnelly, Douglas C. Oakley, Antonio Napoleone, Erik K. Duerr, Simon Verghese, Richard D. Younger
-
Publication number: 20100205570Abstract: An approach is provided for converting a polygon described as an ordered list of perimeter points into a set of connected quadrilaterals suitable for use in an advanced integrated circuit router. Edges are constructed between the points of the polygon. Then, one or more edges are selected as starting locations. Pairs of edges or portions of pairs of edges are matched to form sequences of quadrilaterals. Methods are provided to determine when edges should be split or skipped to ensure that all quadrilaterals are convex or meet other criteria. Other methods are provided to determine when the matching process should be terminated and restarted at another location. Finally, the sequences of quadrilaterals are joined together to form a data structure suitable for use within an integrated circuit router.Type: ApplicationFiled: February 9, 2010Publication date: August 12, 2010Inventor: David C. Chapman
-
Patent number: 7506289Abstract: A computer-implemented approach for routing an integrated circuit using non-orthogonal routing is accomplished during two phases: a global routing phase and a detailed routing phase. During global routing, routing indicators, in the form of hint polygons, are added to the integrated circuit layout and strategy lists, that include bias directions and straying limits, are generated for the new wires to be added. The hint polygons and strategy lists are used during detailed routing to aid in placing the new wires. If obstacle conflicts or insufficient space problems prevent the detailed routing of a new wire, then an obstacle resolution portion of global routing is used to resolve the obstacle conflict and/or provide additional space in the integrated circuit layout to route the new wires.Type: GrantFiled: June 9, 2006Date of Patent: March 17, 2009Inventor: David C. Chapman
-
Patent number: 7065729Abstract: A computer-implemented approach for routing an integrated circuit using non-orthogonal routing is accomplished during two phases: a global routing phase and a detailed routing phase. During global routing, routing indicators, in the form of hint polygons, are added to the integrated circuit layout and strategy lists, that include bias directions and straying limits, are generated for the new wires to be added. The hint polygons and strategy lists are used during detailed routing to aid in placing the new wires. If obstacle conflicts or insufficient space problems prevent the detailed routing of a new wire, then an obstacle resolution portion of global routing is used to resolve the obstacle conflict and/or provide additional space in the integrated circuit layout to route the new wires.Type: GrantFiled: October 19, 1999Date of Patent: June 20, 2006Inventor: David C. Chapman
-
Patent number: 6275971Abstract: Disclosed is a method for checking integrated circuit layout design files. The method includes identifying a via geometry that is laid out on a via mask file. Identifying a metallization geometry that is laid out on a metallization mask file. Shifting the via geometry in a first orientation to produce a first shifted via geometry. Performing a logical AND between the first shifted via geometry and the metallization geometry. The method further includes determining whether the logical AND produces a value indicative of a sufficient overlap between the identified metallization geometry and the first shifted via geometry.Type: GrantFiled: September 30, 1997Date of Patent: August 14, 2001Assignee: Philips Electronics North America CorporationInventors: Harold J. Levy, Subhas Bothra, David C. Chapman
-
Patent number: 6128767Abstract: An approach for representing polygons in an integrated circuit (IC) layout is provided. Polygons are represented by one or more wires, which in turn are each represented by one or more wire segments. Each wire segment is represented by a pair of directed line segments. A data structure hierarchy includes polygon data, wire data, wire segment data and branch data. The polygon data represents a set of IC devices to be represented in the IC layout. The wire data represents the wires that represent the polygons and specifies the associated wire segments and associated polygons. The wire segment data represents the wire segments and specifies the associated directed line segments for each wire segment that represent the wires and references the wire data. The branch data specifies connections between wires by specifying the connecting wire segments in the wires.Type: GrantFiled: October 30, 1997Date of Patent: October 3, 2000Inventor: David C. Chapman
-
Patent number: 5815416Abstract: In a computer implemented circuit simulator, a method is provided for measuring energy consumption of a circuit under test during a measurement interval. The method comprises a series of computer implemented steps. A supply voltage is applied to the circuit under test. A current flowing through the circuit under test is then measured. A mirror voltage, representative of the value of the current, is generated. A capacitor is charged, with a power parameter voltage equal to the product of the supply voltage and the mirror voltage, during the measurement interval. An accumulated voltage is measured across the capacitor, wherein the accumulated voltage is representative of energy consumed by the circuit under test.Type: GrantFiled: April 19, 1996Date of Patent: September 29, 1998Assignee: VLSI Technology, Inc.Inventors: Peter Liebmann, Michael N. Misheloff, David C. Chapman
-
Patent number: 5113451Abstract: A method for labelling polygons of a geometric layout which includes the steps of scanning a geometric layout during a first scan line pass to detect objects which form a polygon, processing the scan line at each occurrence of an event to detect the objects which contact the scan line, assigning temporary numbers and root designators to the objects which contact the scan line in accordance with a sorting criterion, updating the temporary numbers assigned to the objects to keep the temporary number associated with the earliest root designator of each separately detected polygon, and renaming each object which forms a part of the same polygon with a common label. The step of updating includes the steps of numbering each object in a polygon with a temporary number assigned to a root object of the polygon, and storing, in a sorted order, the root objects which lose their status as root objects during the step of updating.Type: GrantFiled: October 16, 1989Date of Patent: May 12, 1992Assignee: VLSI Technology, Inc.Inventors: David C. Chapman, Herve G. Duprez
-
Patent number: 4849313Abstract: An apparatus and a method for making a reticle mask is disclosed. A reticle mask is made by the double pass method wherein scribe lines are first drawn on the reticle mask. Thereafter, a product die pattern is made in the reticle mask by a plurality of times. A plurality of alignment marks are associated with each product die pattern. The plurality of alignment marks are all written in the scribe line region. Thus, any deviation of the relative position of the product die pattern to the scribe line may be quantified.Type: GrantFiled: April 28, 1988Date of Patent: July 18, 1989Assignee: VLSI Technology, Inc.Inventors: David C. Chapman, Wesley R. Erck