Patents by Inventor David C. Rowan

David C. Rowan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 3944419
    Abstract: To avoid damaging photolithographic masks and photoresist coatings on articles during selective exposure of the photoresist coatings, the mask is held very near to, but not in contact with, the photoresist coating during the selective exposure. Because of the close spacing involved, such a technique is commonly termed "proximity printing." To provide suitable spacers for holding a mask in uniform proximity with a photoresist coating, a plurality of droplets of a liquid acrylic resin are dispensed onto the mask and cured in air to harden them. For proximity printing, the mask is simply pressed against the photoresist coating with the droplets therebetween and light of sufficient wavelength and intensity is directed selectively onto the coating through the mask for a sufficient time.
    Type: Grant
    Filed: January 30, 1975
    Date of Patent: March 16, 1976
    Assignee: Western Electric Co., Inc.
    Inventors: Alfred I. Bigatel, Quentin T. Jarrett, Ronald A. Petskus, David C. Rowan, Joseph M. Scheetz
  • Patent number: D262115
    Type: Grant
    Filed: May 29, 1979
    Date of Patent: December 1, 1981
    Assignee: Tokheim Corporation
    Inventors: David C. Rowan, Armin E. Mittermaier
  • Patent number: D262970
    Type: Grant
    Filed: May 29, 1979
    Date of Patent: February 9, 1982
    Assignee: Tokheim Corporation
    Inventors: David C. Rowan, Armin E. Mittermaier
  • Patent number: D264471
    Type: Grant
    Filed: November 9, 1978
    Date of Patent: May 18, 1982
    Inventors: David C. Rowan, Armin E. Mittermaier