Patents by Inventor David C. Sauer

David C. Sauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7256221
    Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
    Type: Grant
    Filed: November 7, 2003
    Date of Patent: August 14, 2007
    Assignee: Corning Incorporated
    Inventors: Kelsee L. Coykendall, Paul G. Dewa, Robert Sabia, David C. Sauer, Paul J. Shustack, Kamal K. Soni
  • Publication number: 20040092618
    Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
    Type: Application
    Filed: November 7, 2003
    Publication date: May 13, 2004
    Inventors: Kelsee L. Coykendall, Paul G. Dewa, Robert Sabia, David C. Sauer, Paul J. Shustack, Kamal K. Soni
  • Patent number: 6532767
    Abstract: Methods for producing high purity fused silica (HPFS) glass having desired levels of dissolved hydrogen are provided. The methods involve measuring the level of hydrogen in the cavity of the furnace used to produce the glass and controlling the pressure within the furnace and/or gas flows to the furnace's burners so that the measured concentration has a desired value. In this way, the level of dissolved hydrogen in the glass can be controlled since, as shown in FIG. 3, there is a direct correlation between the hydrogen concentration in the cavity atmosphere and level of dissolved hydrogen in the glass.
    Type: Grant
    Filed: September 12, 2000
    Date of Patent: March 18, 2003
    Assignee: Corning Incorporated
    Inventors: Raymond E. Lindner, Mahendra Kumar Misra, David C. Sauer