Abstract: A target for sputtering, use of the target and method of manufacture of the target is provided. The target has a single piece target material for sputter deposition, with at least 1 mm thickness of material for sputtering, having a lamellar structure and comprising a metal oxide with at least 50 wt. % or more of tungsten oxide. The atomic ratio of oxygen over tungsten results in a compound with oxygen deficiency with respect to the stoichiometric tungsten oxide. The method includes spraying metallic tungsten and/or tungsten oxide powder in amounts so as to provide a layer of material for sputtering being at least 1 mm thick and comprising non-stoichiometric tungsten oxide.

Abstract: The invention utilizes a chemical/biological hood with a filter-blower system that is attached to the chemical/biological hood. The filter-blower system provides overpressure to the hood only. The hood is fitted to or attached to a chemical/biological mask. Overpressure created by the filter-blower around the mask is created and is independent of the wearer's respiration so that over-breathing of the positive pressure is not possible. Typically this system would be available as a hood capable of providing enhanced protection. However, the filter-blower and hood system could be integrated with the mask. Cinching or sealing the hood at the neck can improve overpressure performance.