Abstract: A system and method for a waferless cleaning method for a capacitive coupled plasma system. The method includes forming a protective layer on a top surface of an electrostatic chuck, volatilizing etch byproducts deposited on one or more inner surfaces of the plasma process chamber, removing volatilized etch byproducts from the plasma process chamber and removing the protective layer from the top surface of the electrostatic chuck. A capacitive coupled plasma system including a waferless cleaning recipe is also described.

Abstract: An apparatus and system for plasma processing a substrate using RF power includes a chamber having walls for housing an electrostatic chuck (ESC) and a top electrode. The top electrode is oriented opposite the ESC to define a processing region. An inner line with a tubular shaped wall is defined within and is spaced apart from the walls of the chamber and is oriented to surround the processing region. The tubular shaped wall extends a height between a top and a bottom. The tubular shaped wall has functional openings for substrate access and facilities access and dummy openings oriented to define symmetry for selected ones of the functional openings. A plurality of straps are connected to the bottom of the tubular shaped wall of the inner liner and are electrically coupled to a ground ring within the chamber to provide an RF power return path during plasma processing.

Abstract: A system and method for a waferless cleaning method for a capacitive coupled plasma system. The method includes forming a protective layer on a top surface of an electrostatic chuck, volatilizing etch byproducts deposited on one or more inner surfaces of the plasma process chamber, removing volatilized etch byproducts from the plasma process chamber and removing the protective layer from the top surface of the electrostatic chuck. A capacitive coupled plasma system including a waferless cleaning recipe is also described.

Abstract: A system and method for a waferless cleaning method for a capacitive coupled plasma system. The method includes forming a protective layer on a top surface of an electrostatic chuck, volatilizing etch byproducts deposited on one or more inner surfaces of the plasma process chamber, removing volatilized etch byproducts from the plasma process chamber and removing the protective layer from the top surface of the electrostatic chuck. A capacitive coupled plasma system including a waferless cleaning recipe is also described.

Abstract: A system and method for a waferless cleaning method for a capacitive coupled plasma system. The method includes forming a protective layer on a top surface of an electrostatic chuck, volatilizing etch byproducts deposited on one or more inner surfaces of the plasma process chamber, removing volatilized etch byproducts from the plasma process chamber and removing the protective layer from the top surface of the electrostatic chuck. A capacitive coupled plasma system including a waferless cleaning recipe is also described.

Abstract: A method for cleaning metallic contaminants from an upper electrode used in a plasma chamber. The method comprises a step of soaking the upper electrode in a cleaning solution of concentrated ammonium hydroxide, hydrogen peroxide and water. The cleaning solution is free of hydrofluoric acid and hydrochloric acid. The method further comprises an optional step of soaking the upper electrode in dilute nitric acid and rinsing the cleaned upper electrode.

Abstract: A plasma confinement ring assembly with a single movable lower ring can be used for controlling wafer area pressure in a capacitively coupled plasma reaction chamber wherein a wafer is supported on a lower electrode assembly and process gas is introduced into the chamber by an upper showerhead electrode assembly. The assembly includes an upper ring, the lower ring, hangers, hanger caps, spacer sleeves and washers. The lower ring is supported by the hangers and is movable towards the upper ring when the washers come into contact with the lower electrode assembly during adjustment of the gap between the upper and lower electrodes. The hanger caps engage upper ends of the hangers and fit in upper portions of hanger bores in the upper ring. The spacer sleeves surround lower sections of the hangers and fit within lower portions of the hanger bores. The washers fit between enlarged heads of the hangers and a lower surface of the lower ring.

Abstract: A system for verifying one or more downloaded components 54 of a gaming device 10 that includes the gaming device, which has an alterable hard drive 80 (or other persistent storage media 90), and the downloaded components that further include gaming-related content 92-96. A related method includes: enabling initiation of a game on the gaming device 10; downloading the gaming-related content 92-96 to the alterable hard drive 80 while the gaming device 10 is enabled for game play; reading an identifier associated with the gaming-related content 92-96; verifying that the identifier is valid (using verification software 70); and reconfiguring the gaming device 10 to utilize the newly-downloaded, gaming-related content 92-96 in response to an initiating event.

Abstract: A method is disclosed for authenticating a gaming device, wherein the gaming device includes a plurality of components, one of which is a storage device.

Abstract: An apparatus and system for plasma processing a substrate using RF power includes a chamber having walls for housing an electrostatic chuck (ESC) and a top electrode. The top electrode is oriented opposite the ESC to define a processing region. An inner line with a tubular shaped wall is defined within and is spaced apart from the walls of the chamber and is oriented to surround the processing region. The tubular shaped wall extends a height between a top and a bottom. The tubular shaped wall has functional openings for substrate access and facilities access and dummy openings oriented to define symmetry for selected ones of the functional openings. A plurality of straps are connected to the bottom of the tubular shaped wall of the inner liner and are electrically coupled to a ground ring within the chamber to provide an RF power return path during plasma processing.

Abstract: The gaming network described herein includes network security features, host security features, audit protocols, and design architecture approaches to reduce the possibility of network attacks. The gaming network provides for traffic confidentiality, encryption, message authentication, secure authentication mechanisms, anti-replay protection of traffic, key management mechanisms, robust network availability, misrouting and redirection protection and prevention, rejection of external traffic, and a high entry-barrier to device addition to the network. The host protection and security includes secure host initialization, disabling unneeded components, download verification, disabling of unused IP ports, discarding traffic, strong passwords, dynamic one-time passwords for remote login, disabling default accounts, and appropriate “least-level” device privileges.

Abstract: A plasma confinement ring assembly with a single movable lower ring can be used for controlling wafer area pressure in a capacitively coupled plasma reaction chamber wherein a wafer is supported on a lower electrode assembly and process gas is introduced into the chamber by an upper showerhead electrode assembly. The assembly includes an upper ring, the lower ring, hangers, hanger caps, spacer sleeves and washers. The lower ring is supported by the hangers and is movable towards the upper ring when the washers come into contact with the lower electrode assembly during adjustment of the gap between the upper and lower electrodes. The hanger caps engage upper ends of the hangers and fit in upper portions of hanger bores in the upper ring. The spacer sleeves surround lower sections of the hangers and fit within lower portions of the hanger bores. The washers fit between enlarged heads of the hangers and a lower surface of the lower ring.

Abstract: A method for cleaning metallic contaminants from an upper electrode used in a plasma chamber. The method comprises a step of soaking the upper electrode in a cleaning solution of concentrated ammonium hydroxide, hydrogen peroxide and water. The cleaning solution is free of hydrofluoric acid and hydrochloric acid. The method further comprises an optional step of soaking the upper electrode in dilute nitric acid and rinsing the cleaned upper electrode.

Abstract: A rollback attack prevention system 10 for a gaming machine 20 includes a configuration log 30 and a revocation list 40. Preferably, the configuration log 30 includes a protected record of software that has been installed on the gaming machine 20. Further, the revocation list 40 includes an inventory of unauthorized software that the prevention system 10 prevents from being installed and/or used on the gaming machine 20.

Abstract: A rollback attack prevention system 10 for a gaming machine 20 includes a configuration log 30 and a revocation list 40. Preferably, the configuration log 30 includes a protected record of software that has been installed on the gaming machine 20. Further, the revocation list 40 includes an inventory of unauthorized software that the prevention system 10 prevents from being installed and/or used on the gaming machine 20.

Abstract: A method is disclosed for authenticating a gaming device, wherein the gaming device includes a plurality of components, one of which is a storage device.

Abstract: There is provided a method and system for verifying a device, having components. Identification numbers of the components are read and then verified. The process of verifying comprises matching each identification number in a database to determine whether each identification number is valid. In one embodiment, the database is remote from the device, wherein verification is performed over a network connecting a database server containing the database with the device. The device transmits the identification numbers for each of the components to the database server for verification. A file allocation structure reader may be located in a basic input/output system of the device for reading and verifying data files from a persistent storage media without loading an operating system. The device may comprise a gaming machine that contains a monitor for monitoring one or more system events being processed by the gaming machine. The monitor monitors routine and non-routine events.

Abstract: There is provided a method and system for verifying a device, having components. Identification numbers of the components are read and then verified. The process of verifying comprises matching each identification number in a database to determine whether each identification number is valid. In one embodiment, the database is remote from the device, wherein verification is performed over a network connecting a database server containing the database with the device. The device transmits the identification numbers for each of the components to the database server for verification. A file allocation structure reader may be located in a basic input/output system of the device for reading and verifying data files from a persistent storage media without loading an operating system. The device may comprise a gaming machine that contains a monitor for monitoring one or more system events being processed by the gaming machine. The monitor monitors routine and non-routine events.

Abstract: A novel enhanced system for connecting to preexisting wiring in buildings allows users with little experience wiring walls to safely change wiring receptacles and change the wiring at outlets throughout the building. Use of such a system improves safety by preventing contact with exposed wires. Moreover, users may exchange or replace wire behind wall using a novel replacement system.