Patents by Inventor David Charles Reynolds

David Charles Reynolds has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10297359
    Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: May 21, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon
  • Patent number: 10269528
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: April 23, 2019
    Assignee: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, David Charles Reynolds
  • Publication number: 20190088438
    Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
    Type: Application
    Filed: October 13, 2017
    Publication date: March 21, 2019
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon
  • Publication number: 20180144901
    Abstract: An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.
    Type: Application
    Filed: October 13, 2017
    Publication date: May 24, 2018
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, David Charles Reynolds, Alan Francis Lyon
  • Publication number: 20170261442
    Abstract: This disclosure presents systems for x-ray microscopy using an array of micro-beams having a micro- or nano-scale beam intensity profile to provide selective illumination of micro- or nano-scale regions of an object. An array detector is positioned such that each pixel of the detector only detects x-rays corresponding to a single micro- or nano-beam. This allows the signal arising from each x-ray detector pixel to be identified with the specific, limited micro- or nano-scale region illuminated, allowing sampled transmission image of the object at a micro- or nano-scale to be generated while using a detector with pixels having a larger size and scale. Detectors with higher quantum efficiency may therefore be used, since the lateral resolution is provided solely by the dimensions of the micro- or nano-beams. The micro- or nano-scale beams may be generated using an arrayed x-ray source or a set of Talbot interference fringes.
    Type: Application
    Filed: May 26, 2017
    Publication date: September 14, 2017
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Srivatsan Seshadri, Alan Francis Lyon, David Charles Reynolds
  • Publication number: 20160351370
    Abstract: A compact source for high brightness x-ray generation is disclosed. The higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This may be achieved through the use of x-ray targets that comprise microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of the x-ray generating material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of a take-off angle at or near 0°, allowing the accumulation of x-rays from several microstructures to be aligned and be used to form a beam in the shape of an annular cone.
    Type: Application
    Filed: May 27, 2016
    Publication date: December 1, 2016
    Applicant: Sigray, Inc.
    Inventors: Wenbing Yun, Sylvia Jia Yun Lewis, Janos Kirz, Alan Francis Lyon, David Charles Reynolds
  • Publication number: 20040009422
    Abstract: A transfer medium for receiving and subsequently applying an electrostatically deposited toner image onto a substrate, the medium having a polypropylene-containing, transparent film image carrier sheet with front and back surfaces and a smooth paper or film backing sheet adhered to the back surface of the image carrier sheet with a releasable adhesive. A method for using the subject transfer medium to transfer a toner image deposited onto the front surface of the polymeric film image carrier sheet to a substrate is also disclosed. Once the backing sheet is removed from the film image carrier sheet following image deposition, the transparency of the image carrier sheet facilitates registration of multiple layers on the substrate.
    Type: Application
    Filed: July 12, 2002
    Publication date: January 15, 2004
    Inventor: David Charles Reynolds