Abstract: Xenon is contained within articles of manufacture such as light bulbs. Described herein are an apparatus, system, a method to capture and collect the xenon contained in articles of manufacture such as defective light bulbs for recovery and/or reuse.

Abstract: Process gas(es), such as but not limited to helium, can be used in the manufacture of a variety of objects. Described herein are methods to collect, reuse, and recycle the process gas(es) that are used in the production process rather than treat these materials as waste.

Abstract: A leak test apparatus for leak testing a tank including a gas supply system configured to provide to the tank a leak detection gas mixture including hydrogen, a test chamber having a cavity for sealably enclosing the tank such that dead space exists outside the tank and within the cavity, and a gas conduit configured to interconnect the gas supply system and the tank, a control system including a controller programmed to pressurize the tank with the leak detection mixture by flowing gas from the gas supply system through the gas conduit, and a leak detector to determine the presence or absence of a leak in the tank by measuring a concentration of hydrogen in the dead space.

Abstract: Process gas(es), such as but not limited to helium, can be used in the manufacture of a variety of objects. Described herein are methods to collect, reuse, and recycle the process gas(es) that are used in the production process rather than treat these materials as waste.

Abstract: Xenon is contained within articles of manufacture such as light bulbs. Described herein are an apparatus, system, a method to capture and collect the xenon contained in articles of manufacture such as defective light bulbs for recovery and/or reuse.

Abstract: Condensable materials, such as but not limited to tungsten fluoride (WF6), can be used deposit films in a chemical vapor deposition (CVD) process. Described herein are methods to collect and reuse the condensable materials that are unreacted in the production process rather than treat these materials as waste. In one embodiment, when a condensable material, such as gaseous WF6, is not supplied to the CVD reactor, it is redirected to a recovery cabinet for capture.

Abstract: An apparatus and process for recovering a desired gas such as xenon difluoride, xenon, argon, helium or neon, from the effluent of a chemical process reactor that utilizes such gases alone or in a gas mixture or in a molecule that becomes decomposed wherein the chemical process reactor uses a sequence of different gas composition not all of which contain the desired gas and the desired gas is captured and recovered substantially only during the time the desired gas is in the effluent.

Abstract: The present invention discloses the improvements to a vacuum swing adsorption (VSA) process used for Xe recovery. By only collecting the recovered gas mixture after the initial evacuation of N2 from the adsorbent vessel and void space, the recovered Xe is not diluted by N2 contained in the adsorbent vessel and void space. The concentration of the recovered Xe can by increased (high purity), simultaneously little Xenon is lost. During the initial evacuation of N2, the vessel has been evacuated to a pressure less than 1 atmospheric pressure, for example, from 100 to 1 torr.

Abstract: The present invention discloses the improvements to a vacuum swing adsorption (VSA) process used for Xe recovery. By only collecting the recovered gas mixture after the initial evacuation of N2 from the adsorbent vessel and void space, the recovered Xe is not diluted by N2 contained in the adsorbent vessel and void space. The concentration of the recovered Xe can by increased (high purity), simultaneously little Xenon is lost. During the initial evacuation of N2, the vessel has been evacuated to a pressure less than 1 atmospheric pressure, for example, from 100 to 1 torr.

Abstract: An apparatus and process for recovering a desired gas such as xenon difluoride, xenon, argon, helium or neon, from the effluent of a chemical process reactor that utilizes such gases alone or in a gas mixture or in a molecule that becomes decomposed wherein the chemical process reactor uses a sequence of different gas composition not all of which contain the desired gas and the desired gas is captured and recovered substantially only during the time the desired gas is in the effluent.