Patents by Inventor David Christopher Christopher Ockwell

David Christopher Christopher Ockwell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method
    Patent number: 7679714
    Abstract: A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: March 16, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Onvlee, Reinder Teun Plug, Hubert Marie Segers, David Christopher Christopher Ockwell, Paul Jacques Van Wijnen, Suzan Leonie Auer-Jongepier