Patents by Inventor David CHUI

David CHUI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230206380
    Abstract: A processor for optimizing partial writes to compressed blocks is configured to identify that a write request targets less than an entirety of a compressed block of pixel data, identify, based on a compression key, a compressed segment of the compressed block of pixel data that includes a target of the write request, and decompress, responsive to the write request, only the identified compressed segment of the compressed block of pixel data.
    Type: Application
    Filed: December 28, 2021
    Publication date: June 29, 2023
    Inventors: ANTHONY HC CHAN, CHRISTOPHER J. BRENNAN, MARK FOWLER, DAVID CHUI, LEON K.N. LAI, JIMSHED MIRZA
  • Patent number: 10256111
    Abstract: A method for polishing dies locations on a substrate with a polishing module. A thickness at selected locations on the substrate is premeasured at a metrology station, each location corresponding to a location of a single die. The thickness obtained by the metrology station for the selected locations of the substrate is provided to a controller of a polishing module. The thickness corrections for each selected location on the substrate are determined. A polishing step in a polishing recipe is formed from the thickness correction for each selected location. A polishing parameter for each die location is calculated for the recipe.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: April 9, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Eric Lau, King Yi Heung, Charles C. Garretson, Jun Qian, Thomas H. Osterheld, Shuchivrat Datar, David Chui
  • Publication number: 20180005842
    Abstract: A method for polishing dies locations on a substrate with a polishing module. A thickness at selected locations on the substrate is premeasured at a metrology station, each location corresponding to a location of a single die. The thickness obtained by the metrology station for the selected locations of the substrate is provided to a controller of a polishing module. The thickness corrections for each selected location on the substrate are determined. A polishing step in a polishing recipe is formed from the thickness correction for each selected location. A polishing parameter for each die location is calculated for the recipe.
    Type: Application
    Filed: June 13, 2017
    Publication date: January 4, 2018
    Inventors: Eric LAU, King Yi HEUNG, Charles C. GARRETSON, Jun QIAN, Thomas H. OSTERHELD, Shuchivrat DATAR, David CHUI