Patents by Inventor David Craig Oram

David Craig Oram has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System, method and non-transitory computer readable medium for tuning sensitivities of, and determining a process window for, a modulated wafer
    Patent number: 11139216
    Abstract: A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.
    Type: Grant
    Filed: April 29, 2020
    Date of Patent: October 5, 2021
    Assignee: KLA-TENCOR CORPORATION
    Inventors: David Craig Oram, Abhinav Mathur, Kenong Wu, Eugene Shifrin
  • SYSTEM, METHOD AND NON-TRANSITORY COMPUTER READABLE MEDIUM FOR TUNING SENSITIVIES OF, AND DETERMINING A PROCESS WINDOW FOR, A MODULATED WAFER
    Publication number: 20200258792
    Abstract: A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.
    Type: Application
    Filed: April 29, 2020
    Publication date: August 13, 2020
    Applicant: KLA-Tencor Corporation
    Inventors: David Craig Oram, Abhinav Mathur, Kenong Wu, Eugene Shifrin
  • System, method and non-transitory computer readable medium for tuning sensitivies of, and determining a process window for, a modulated wafer
    Patent number: 10679909
    Abstract: A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.
    Type: Grant
    Filed: November 14, 2017
    Date of Patent: June 9, 2020
    Assignee: KLA-TENCOR CORPORATION
    Inventors: David Craig Oram, Abhinav Mathur, Kenong Wu, Eugene Shifrin
  • SYSTEM, METHOD AND NON-TRANSITORY COMPUTER READABLE MEDIUM FOR TUNING SENSITIVIES OF, AND DETERMINNG A PROCESS WINDOW FOR, A MODULATED WAFER
    Publication number: 20180144996
    Abstract: A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.
    Type: Application
    Filed: November 14, 2017
    Publication date: May 24, 2018
    Inventors: David Craig Oram, Abhinav Mathur, Kenong Wu, Eugene Shifrin