Abstract: The invention provides in some aspects a system for display of context-aware content that includes a server storing context-sensitive data, a player that is persistently or, at least intermittently, coupled to the server, and that is likewise coupled to a plurality of output devices—such as, for example, electronic shelf labels, personal digital assistants, mobile phones, and LCD, LED or other fixed displays. The player responds to the context of each of the plurality of output devices by obtaining from the server data germane to that context, storing that data or content germane to that context generated from that data, and driving that content to that output device for presentation thereon, wherein the player concurrently drives different content to at least two of said output devices.

Abstract: The invention provides in some aspects a system for display of context-aware content that includes a server storing context-sensitive data, a player that is persistently or, at least intermittently, coupled to the server, and that is likewise coupled to a plurality of output devices—such as, for example, electronic shelf labels, personal digital assistants, mobile phones, and LCD, LED or other fixed displays. The player responds to the context of each of the plurality of output devices by obtaining from the server data germane to that context, storing that data or content germane to that context generated from that data, and driving that content to that output device for presentation thereon, wherein the player concurrently drives different content to at least two of said output devices.

Abstract: Disclosed are methods and systems for estimating a reticle bias state for a process system, that include computing a difference between control data provided to the process system and error data based on a process system output(s), and estimating the reticle bias state based on weighted measures associated with the control data, the weighted measures being based on the number of data points included in the difference. The methods and systems include associating the reticle bias state estimate with a first quality factor, computing at least one weighted measure based on a number of data elements associated with the reticle, using the weighted measure(s) to provide a computed reticle bias state estimate and an associated computed quality factor, and, comparing the computed quality factor with the first quality factor to determine whether to update the reticle bias state estimate with the computed reticle bias state estimate.

Abstract: Systems and methods for controlling at least one reticle-induced error in a process system, the systems and methods including adjusting measurement data associated with the process system, where the adjustment can be based on at least one reticle identifier (ID) associated with the measurement data, and reticle-induced error data associated with the at least one reticle ID. The methods and systems also include combining the adjusted measurement data to compute at least one control for the process system.

Abstract: Disclosed are methods and systems for estimating a reticle bias state for a process system, that include computing a difference between control data provided to the process system and error data based on a process system output(s), and estimating the reticle bias state based on weighted measures associated with the control data, the weighted measures being based on the number of data points included in the difference. The methods and systems include associating the reticle bias state estimate with a first quality factor, computing at least one weighted measure based on a number of data elements associated with the reticle, using the weighted measure(s) to provide a computed reticle bias state estimate and an associated computed quality factor, and, comparing the computed quality factor with the first quality factor to determine whether to update the reticle bias state estimate with the computed reticle bias state estimate.

Abstract: Systems and methods for controlling at least one reticle-induced error in a process system, the systems and methods including adjusting measurement data associated with the process system, where the adjustment can be based on at least one reticle identifier (ID) associated with the measurement data, and reticle-induced error data associated with the at least one reticle ID. The methods and systems also include combining the adjusted measurement data to compute at least one control for the process system.

Abstract: Methods and systems for controlling critical dimension (CD) in a process system, including computing an exposure dose error based on at least one output of the process system, normalizing the computed exposure dose error based on a target exposure dose, and providing an exposure dose to the process system based on at least one normalized exposure dose error. The target exposure dose can be associated with a process system characteristic(s) and can be updated based on normalized computed exposure dose errors.